Femtosecond laser-induced silicon surface morphology in water confinement

Microsystem Technologies

Volumn 15, Issue 7, 2009, Pages 1045-1049

  Han, Yukun ^a   Lin, Cheng Hsiang ^a   Xiao, Hai ^a   Tsai, Hai Lung ^a  

^a Architectural and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTO-SECOND LASER; LASER INDUCED PERIODIC STRUCTURES; LASER PARAMETERS; SILICON SURFACE MORPHOLOGY; SILICON SURFACES; SILICON WAFER SURFACE; SURFACE QUALITIES; UNDER WATER; WATER CONFINEMENT;

INDUSTRIAL APPLICATIONS; LASERS; MORPHOLOGY; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; ULTRASHORT PULSES;

SURFACE MORPHOLOGY;

EID: 67650409756     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-009-0880-8     Document Type: Article

References (5)

1. Y Dong P Molian 2003 Femtosecond pulsed laser ablation of 3C-SiC thin film on silicon Appl Phys A 77 839 846 10.1007/s00339-003-2103-y
2. Y Dong C Zorman P Molian 2003 Femtosecond laser micromachining of single crystalline 3C-SiC structures based on a laser-induced defect-activation process J Micromech Microeng 13 680 685 10.1088/0960-1317/13/5/320
3. Georgescu I (2003) Pattern formation upon femtosecond laser ablation of transparent dielectrics. Diploma Thesis, Brandenburgische Technische Universität Cottbus
4. DJ Hwang TY Choi CP Grigoropoulos 2004 Liquid-assisted femtosecond laser drilling of straight and three-dimensional microchannels in glass Appl Phys A 79 605 612 10.1007/s00339-004-2547-8
5. G Seifert M Kaempfe F Syrowatka C Harnagea D Hesse H Graener 2005 Self-organized structure formation on the bottom of femtosecond laser ablation craters in glass Appl Phys A 81 799 803 10.1007/s00339-004-2867-8