Chemical degelation of polysilane organogel by selective scission of silicon main chain by fluoride anion

Chemistry Letters

Volumn 38, Issue 5, 2009, Pages 414-415

  Naito, Masanobu ^a   Kawabe, Takuma ^a   Nakamura, Masashi ^a   Wakayama, Keiji ^a   Chung, Woojung ^a   Yasui, Ken Ichiro ^a   Fujiki, Michiya ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67650363906     PISSN: 03667022     EISSN: 13480715     Source Type: Journal    
DOI: 10.1246/cl.2009.414     Document Type: Article

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