Surface texturing of crystalline silicon and effective area measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4086, Issue , 2000, Pages 116-119

  Sun, Tietun ^a   Chen, Dong ^a   Chui, Rongqiang ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITANCE MEASUREMENT; ETCHING; SILICON; TEXTURES;

CRYSTALLINE SILICONS; EFFECTIVE AREA; MOS STRUCTURE; SILICON SURFACES; SURFACE AREA; SURFACE-TEXTURING;

SOLAR CELLS;

EID: 67650267126     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.408408     Document Type: Conference Paper

References (3)

1. S.M.Sze. Physical of semiconductor devices, New York; 1969
2. Kainer Ruckteschler, Analysis of the contact solar cell design and of other high efficiency concepts, 9th E.C. Photovoltaics solar energy conference, 1994
3. M.A.Green et.al. Improvements in silicon cell and module performance, 91h E.C. Photovoltaics solar energy conference, 1994