A test structure for assessing individual contact resistance

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 2009, Pages 201-204

  Liu, Frank ^a   Agarwal, Kanak ^a  

^a IBM AUSTIN RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCURATE MEASUREMENT; CMOS TECHNOLOGY; MEASUREMENT RESULTS; NANOMETER CMOS; RESISTANCE MEASUREMENT; TEST STRUCTURE;

CMOS INTEGRATED CIRCUITS; CONTACT RESISTANCE;

TESTING;

EID: 67650104750     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMTS.2009.4814641     Document Type: Conference Paper

References (4)

1. T Harnamoto, T. Ozaki, M. Aoki, and Y Ishibashi. Measurement of contact resistane distribution using a 4kq-contacts array. IEEE Tra ctions on SmCioductor Manfacturinf, 9(1):9-14, Feb 1996. (Pubitemid 126784455)
2. N. Kaai, H. Kbga, and Y Takaishi. Conct resistance mesurement of a 130-nm-diameter poly-Si plug on a lightly doped single diffusion rion in giga-bit DRAMs, In IEEE itetratiorat Coiernce on Microelectroic Test Stuctues, pages 177-181, 2001.
3. H. Sayah and M. Buehler Comb/seipenitne/coss-bridge test structure fr fabrication pocess evaluation. In IEEE Iter tiotnl Coference on imelectronie Test Structures, pages 23- 28, 1988.
4. H. Sayah and M. Buehler Linevidth and step resistance distribution measurement using an addressable array. In IEEE Imer Conference Microelect nic Tst Structures, pas 87-92, 1990. (Pubitemid 20724617)