Preparation of LaGaO3 based oxide thin film on porous ni-fe metal substrate and its SOFC Application

Journal of the Korean Ceramic Society

Volumn 45, Issue 12, 2008, Pages 796-801

  Ju, Young Wan ^a   Matsumoto, Hiroshige ^a   Ishihara, Tatsumi ^b   Inagaki, Toru ^b   Eto, Hiroyuki ^c  

^a KYUSHU UNIVERSITY   (Japan)

^b KANSAI ELECTRIC POWER CO   (Japan)

^c MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

Lagao3 electrolyte; Metal support; Pulse laser ablation

Indexed keywords

A-THERMAL; AMORPHOUS STATE; DEPOSITION TEMPERATURES; ELECTROLYTE FILMS; FE METAL; FILM COMPOSITION; LAGAO3 ELECTROLYTE; METAL SUPPORT; OPEN CIRCUIT POTENTIAL; OXIDE THIN FILMS; POROUS METAL; POROUS NI; POROUS SUBSTRATES; POST ANNEALING; PULSE LASER ABLATION; PULSED LASER; REDUCTION TEMPERATURES; ROOM TEMPERATURE; SINGLE PHASE; THERMAL EXPANSION COEFFICIENTS; THERMAL REDUCTION; VOLUMETRIC SHRINKAGE;

ELECTROLYSIS; ELECTROLYTES; LASER ABLATION; LASER APPLICATIONS; LASERS; METALS; NICKEL; OXIDE MINERALS; PEROVSKITE; PULSED LASER DEPOSITION; SUBSTRATES; THERMAL EXPANSION; THERMAL STRESS; THIN FILM DEVICES; THIN FILMS;

FILM PREPARATION;

EID: 67649962261     PISSN: 12297801     EISSN: None     Source Type: Journal    
DOI: 10.4191/KCERS.2008.45.1.796     Document Type: Article

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