SCOPUS 정보 검색 플랫폼

Volumn 44, Issue 13, 2009, Pages 3370-3375

Effect of etch-treatment upon the intensity and peak position of photoluminescence spectra for anodic alumina films with ordered nanopore array

(5) Liu, Yi Fan a Tu, Ya Fang a Huang, Sheng You a Sang, Jian Ping a,b Zou, Xian Wu a

a WUHAN UNIVERSITY (China)

b JIANGHAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ALUMINA FILM; ETCHING TIME; F CENTERS; LUMINESCENCE CENTERS; NANOPORE ARRAY; OXALIC ACID; PEAK POSITION; PHOTOLUMINESCENCE INTENSITIES; PHOTOLUMINESCENCE SPECTRUM; PL INTENSITY; PL SPECTRA; PORE WALL; POROUS ANODIC ALUMINA MEMBRANES; SUB-BAND; SUB-BANDS; SURFACE LAYERS;

ALUMINA; ALUMINUM SHEET; COLOR CENTERS; ETCHING; LIGHT; LIGHT EMISSION; PHOSPHORIC ACID; PORE PRESSURE; QUAY WALLS;

PHOTOLUMINESCENCE;

EID: 67649958218 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-009-3440-9 Document Type: Article

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