Influence of dopants Ti and Ni on dehydrogenation properties of NaAlH 4: Electronic structure mechanisms

Journal of Physical Chemistry C

Volumn 113, Issue 23, 2009, Pages 10215-10221

  Song, Y ^a   Dai, J H ^a   Li, C G ^a   Yang, R ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; DEHYDROGENATION PROPERTIES; DENSITY-FUNCTIONAL METHODS; ELECTRONIC DISTRIBUTION; INTERSTITIAL SITES; NI-DOPED;

ALUMINUM; ATOMS; DEHYDROGENATION; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; NICKEL; SODIUM COMPOUNDS;

DOPING (ADDITIVES);

EID: 67649909022     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp900254c     Document Type: Article

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