Enhanced field emission of vertically aligned core-shelled carbon nanotubes with molybdenum oxide encapsulation

Journal of Applied Physics

Volumn 105, Issue 11, 2009, Pages

  Yu, J ^a   Sow, C H ^a   Wee, Andrew T S ^a   Chua, Daniel H C ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER HEIGHTS; DEPOSITED COATINGS; ENHANCED FIELD EMISSION; ENHANCED PERFORMANCE; FIELD ENHANCEMENT FACTOR; FIELD-EMISSION CHARACTERISTICS; MATERIAL PROPERTY; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOLYBDENUM OXIDES; PROCESS TEMPERATURE; TURN-ON FIELD; VERTICALLY ALIGNED;

EMISSION SPECTROSCOPY; FIELD EMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLYBDENUM; MOLYBDENUM COMPOUNDS; MULTIWALLED CARBON NANOTUBES (MWCN); ORGANIC CHEMICALS; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NANOTUBES;

EID: 67649556933     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3139289     Document Type: Article

References (28)

1. S. Iijima, Nature (London) 0028-0836 354, 56 (1991). 10.1038/354056a0
2. V. N. Popov, Mater. Sci. Eng. R. 0927-796X 43, 61 (2004). 10.1016/j.mser.2003.10.001
3. M. Paradise and T. Goswami, Mater. Des. 0264-1275 28, 1477 (2007).
4. F. Zhang, J. Shen, J. Sun, Y. Q. Zhu, G. Wang, and G. McCartney, Carbon 0008-6223 43, 1254 (2005). 10.1016/j.carbon.2004.12.019
5. Carbon Nanotubes: Synthesis, Structure, Properties, and Applications, edited by, M. S. Dresselhaus, G. Dresselhaus, and, P. Avouris, (Springer, New York, 2001).
6. Q. Li, S. Fan, W. Han, C. Sun, and W. Liang, Jpn. J. Appl. Phys., Part 2 0021-4922 36, L501 (1997). 10.1143/JJAP.36.L501
7. F. Jin, Y. Liu, C. M. Day, and S. A. Little, Carbon 0008-6223 45, 587 (2007). 10.1016/j.carbon.2006.10.014
8. W. Shen, H. Wang, R. Guan, and Z. Li, Colloids Surf., A 0927-7757 331, 263 (2008). 10.1016/j.colsurfa.2008.08.017
9. M. Salavati-Niasari, S. N. Mirsattari, and M. Bazarganipour, Polyhedron 0277-5387 27, 3653 (2008). 10.1016/j.poly.2008.08.016
10. M. Nagatsu, T. Yoshida, S. Kurita, and K. Murakami, Appl. Surf. Sci. 0169-4332 244, 111 (2005). 10.1016/j.apsusc.2004.10.071
11. A. Jitianu, T. Cacciaguerra, R. Benoit, S. Delpeux, F. Beguin, and S. Bonnamy, Carbon 0008-6223 42, 1147 (2004). 10.1016/j.carbon.2003.12.041
12. T. Liu, H. Q. Tang, X. M. Cai, J. Zhao, D. J. Li, R. Li, and X. L. Sun, Nucl. Instrum. Methods Phys. Res. B 0168-583X 264, 282 (2007). 10.1016/j.nimb.2007.08.095
13. L. Zhao and L. Gao, Carbon 0008-6223 42, 1858 (2004). 10.1016/j.carbon.2004.02.013
14. W. Yi, T. Jeong, S. G. Yu, J. Heo, C. Lee, J. Lee, W. Kim, J. B. Yoo, and J. Kim, Adv. Mater. (Weinheim, Ger.) 0935-9648 14, 1464 (2002). 10.1002/1521-4095(20021016)14:20<1464::AID-ADMA1464>3.0.CO;2-4
15. T. He, Y. Ma, Y. Cao, Y. Yin, W. Yang, and J. Yao, Appl. Surf. Sci. 0169-4332 180, 336 (2001). 10.1016/S0169-4332(01)00370-1
16. M. Razeghi, The MOCVD Challenge, Vol. 2: A Survey of GaInAsP-GaAs for Photonic and Electronic Applications (Institute of Physics, Bristol, England, 1995).
17. C. E. Morosanu, Thin Films by Chemical Vapor Deposition (Elsevier, New York, 1990).
18. H. O. Pierson, Handbook of Chemical Vapor Deposition (CVD): Principles, Technology, and Applications, 2nd ed. (Noyes, Park Ridge, NJ, 1999).
19. J. Chastain, Handbook of X-Ray Photoelectron Spectroscopy (Perkin Elmer Corporation, Physical Electronics Division, Minnesota, 1992).
20. H. Y. Chen, L. Chen, Y. Lu, Q. Hong, H. C. Chua, S. B. Tang, and J. Lin, Catal. Today 0920-5861 96, 161 (2004). 10.1016/j.cattod.2004.06.116
21. R. H. Fowler and L. Nordheim, Proc. R. Soc. London 0370-1662 119, 173 (1928). 10.1098/rspa.1928.0091
22. Y. S. Chen, J. H. Huang, J. L. Hu, C. C. Yang, and W. P. Kang, Carbon 0008-6223 45, 3007 (2007). 10.1016/j.carbon.2007.09.042
23. B. Zhao, B. Yadian, D. Chen, D. Xu, and Y. Zhang, Appl. Surf. Sci. 0169-4332 255, 2087 (2008). 10.1016/j.apsusc.2008.06.185
24. B. K. Singh, S. W. Cho, K. S. Bartwal, N. D. Hoa, and H. Ryu, Solid State Commun. 0038-1098 144, 498 (2007). 10.1016/j.ssc.2007.08.016
25. S. O. Kasap, Principles of Electronic Materials and Devices, 3rd ed. (McGraw-Hill, New York, 2006).
26. L. Nilsson, O. Groening, C. Emmenegger, O. Kuettel, E. Schaller, and L. Schlapbach, Appl. Phys. Lett. 0003-6951 76, 2071 (2000). 10.1063/1.126258
27. R. Seelaboyina, J. Huang, and W. B. Choi, Appl. Phys. Lett. 0003-6951 88, 194104 (2006). 10.1063/1.2203218
28. P. Rai, D. R. Mohapatra, K. S. Hazra, D. S. Misra, and S. P. Tiwari, Appl. Phys. Lett. 0003-6951 93, 131921 (2008). 10.1