Analytical solution of thickness variations in selective area growth by organometallic chemical vapor deposition

Applied Physics Letters

Volumn 94, Issue 25, 2009, Pages

  Liu, X ^a,c   Aspnes, D E ^a,b  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b Kyung Hee University   (South Korea)

^c University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC EXPRESSIONS; ANALYTICAL SOLUTIONS; DEPOSITED FILMS; EXPONENTIAL DEPENDENCE; GROWTH MECHANISMS; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITIONS; PLANAR SURFACE; SELECTIVE AREA GROWTH; THICKNESS VARIATION;

CHEMICAL VAPOR DEPOSITION; CONFORMAL MAPPING; EPITAXIAL GROWTH; ORGANOMETALLICS; SEMICONDUCTOR QUANTUM DOTS; VAPORS;

FILM GROWTH;

EID: 67649502992     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3157266     Document Type: Article

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