SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 83, Issue 11, 2009, Pages 1350-1354

Beam plasma discharge at low magnetic field as plasma source for plasma processing reactor

(4) Shustin, E G a Isaev, N V a Temiryazeva, M P a Fedorov, Yu V b

a INST OF RADIO ENG AND ELECTRONICS (Russian Federation)

b Institute of Ultrahigh Frequency Semiconductor Electronics (Russian Federation)

Author keywords

Beam plasma discharge; Plasma processing reactors; Surface etching

Indexed keywords

ALGAAS/INGAAS/GAAS; BARRIER LAYERS; BEAM PLASMA DISCHARGE; FLOW ENERGY; HETEROSTRUCTURES; ION FLOW; LOW MAGNETIC FIELDS; MEAN ENERGY; MICROWAVE OSCILLATION; PHYSICAL EXPERIMENTS; PHYSICAL MECHANISM; PLASMA DISCHARGE; PLASMA PROCESSING REACTORS; POTENTIAL GRADIENTS; SOFT ETCHING; SURFACE ETCHING;

BEAM PLASMA INTERACTIONS; ELECTRONICS ENGINEERING; ETCHING; IONS; MAGNETIC FIELDS; MICROWAVE OSCILLATORS; MICROWAVES; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMAS;

ELECTRIC DISCHARGES;

EID: 67649479272 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2009.03.033 Document Type: Article

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.