Carbon tetrafluoride plasma modification of polyimide: A method of in-situ formed hydrophilic and hydrophobic surfaces

Surface and Coatings Technology

Volumn 203, Issue 23, 2009, Pages 3527-3532

  Chuang, Miao Ju ^a  

^a CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

Author keywords

Hydrophilic; Hydrophobic; Polyimide (PI); X ray photoelectron spectroscopy (XPS)

Indexed keywords

[CARBONYL; CARBON TETRAFLUORIDE; HYDROPHILIC; HYDROPHILIC AND HYDROPHOBIC; HYDROPHILIC GROUPS; HYDROPHOBIC; HYDROPHOBIC AND HYDROPHILIC; IN-SITU; MODIFICATION CONDITIONS; PI FILM; PLASMA MODIFICATIONS; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS ANALYSIS;

ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; ELECTRON SPECTROSCOPY; HYDROPHILICITY; HYDROPHOBICITY; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PLASMAS; POLYIMIDES; SPECTRUM ANALYSIS; SURFACE CHEMISTRY; SURFACE PROPERTIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67649372495     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.05.020     Document Type: Article

References (26)

1. Inagaki N., Tasaka S., and Hibi K. J. Adhes. Sci. Technol. 8 (1994) 395
2. Park S.J., and Jang Y.S. J. Colloid Interface Sci. 285 (2005) 267
3. De Geyter N., Morent R., Leys C., Gengembre L., Payen E., Van Vlierberghe S., and Schacht E. Surf. Coat. Technol. 202 (2008) 3000
4. Wen C.H., Chuang M.J., and Hsiue G.H. Appl. Surf. Sci. 252 (2006) 3799
5. Turbon G., and Rapeaux M. J. Electrochem. Soc. 130 (1983) 2231
6. Oehrlein G.S., and Lee Y.H. J. Vac. Sci. Technol. A5 (1987) 1585
7. Egitto F.D., Emmi F., Horwath R.S., and Vukanovic V. J. Vac. Sci. Technol. B3 (1985) 893
8. Hopkins J., and Badyal J.P.S. Langmuir 12 (1996) 3666
9. Sigurdsson S., and Shishoo R. J. Appl. Polym. Sci. 66 (1997) 1591
10. Beamson G., and Briggs D. High Resolution XPS of Organic Polymers: The Scienta ESCA300 Database (1992), John Wiley & Sons, New York
11. Poncin-Epaillard F., Pomepui B., and Brosse J. J. Appl. Polym. Sci. Part A: Polym. Chem. 31 (1993) 2671
12. Guimond S., Radu I., Czeremuszkin G., Carlsson D.J., and Wertheimer M.R. Plasmas Polym. 7 (2002) 71
13. Truica-Marasescu F., Jedrzejowski P., and Wertheimer M.R. Plasma Process. Polym. 1 (2004) 153
14. Otto T., Wolf H., Streiter R., Dehoff A., Wandel K., and Gessner T. Microelectron. Eng. 45 (1999) 37
15. Verdonck P., Goodyear A., Mansano R.D., Barroy P.R.J., and St. Braithwaite N. J. Vac. Sci. Technol., B 20 (2002) 791
16. Hopkins J., and Badyal J.P.S. Langmuir 12 (1996) 3666
17. Kogoma M., and Turban G. Plasma Chem. Plasma Process. 6 (1986) 349
18. Tepermeister I., and Sawin H.H. J. Vac. Sci. Technol. A10 (1992) 3149
19. Gengenbach T.R., and Griesser H.J. Surf. Interface Anal. 26 (1998) 498
20. Onyiriuka E.C. J. Vac. Sci. Technol. A11 (1993) 2941
21. Hopkins J., and Badyal J.P.S. J. Phys. Chem. 99 (1995) 4261
22. Cain S.R., Egitto F.D., and Emmi F. J. Vac. Sci. Technol. A5 (1987) 1578
23. Corbin G.A., Cohen R.E., and Baddour R.F. Macromolecules 18 (1985) 98
24. Holländwer A., Klemberg-Sapieha J.E., and Wertheimer M.R. Macromolecules 27 (1994) 2893
25. Wilken R., Holländer A., and Behnisch J. Plasmas Polym. 7 (2002) 185
26. Burton Z., and Bhushan B. Nano Lett. 5 (2005) 1607