Substrate resistance in composite membranes for organic vapour/gas separations

Journal of Membrane Science

Volumn 338, Issue 1-2, 2009, Pages 153-160

  Liu, Li ^a   Jiang, Nan ^a   Burns, Charles M ^a   Chakma, Amit ^a   Feng, Xianshe ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Composite membrane; Gas and vapour separation; Hollow fiber; Poly(dimethyl siloxane); Poly(ether block amide); Resistance model; Substrate resistance

Indexed keywords

ADVANCED COMPOSITES; GAS PERMEATION; HIGH FLUX; HOLLOW FIBER; HOLLOW FIBER COMPOSITE MEMBRANES; INTRINSIC SELECTIVITY; LIGHT OLEFINS; MASS-TRANSPORT RESISTANCE; PERMSELECTIVITIES; POLY(ETHER BLOCK AMIDE); RESISTANCE MODEL; RUBBERY POLYMERS; SKIN LAYER; SKIN LAYER THICKNESS; SKIN THICKNESS; SUBSTRATE RESISTANCE; SUBSTRATE STRUCTURE; VALUABLE COMPONENT;

AMIDES; COMPOSITE MEMBRANES; EMISSION CONTROL; ETHERS; OLEFINS; PERMEATION; SEPARATION; SILICONES; SKIN; SUBSTRATES; VOLATILE ORGANIC COMPOUNDS;

GAS PERMEABLE MEMBRANES;

ALKENE; DIMETICONE; NITROGEN; POLYSULFONE; VOLATILE ORGANIC COMPOUND;

AIR POLLUTION CONTROL; ARTICLE; ATMOSPHERIC PRESSURE; HOLLOW FIBER MEMBRANE; MEMBRANE RESISTANCE; MEMBRANE TRANSPORT; MOLECULAR MODEL; PRIORITY JOURNAL; PROCESS OPTIMIZATION; SEPARATION TECHNIQUE;

EID: 67649283552     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.memsci.2009.04.019     Document Type: Article

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