Intermixing and formation of Pd-Mg intermetallics in Pd/Mg/Si films

Journal of Alloys and Compounds

Volumn 481, Issue 1-2, 2009, Pages 714-718

  Reddy, G L N ^a   Kumar, Sanjiv ^a   Sunitha, Y ^a   Kalavathi, S ^b   Raju, V S ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Grain boundaries; Hydrogen storage; Intermetallic compounds; Pd Mg; RBS

Indexed keywords

ANNEALING IN VACUUM; ANNEALING TEMPERATURES; ELECTRON BEAM EVAPORATION; GLANCING INCIDENCE X-RAY DIFFRACTIONS; HYDROGEN ATMOSPHERE; IN-VACUUM; INTERFACIAL REGION; INTERMETALLIC COMPOUNDS; MG FILMS; PD-MG; RBS; RUTHERFORD BACKSCATTERING SPECTROMETRY; SI FILMS; STRUCTURAL CHANGE; TEMPERATURE RANGE; VACUUM-ANNEALING; XRD;

ANNEALING; ATMOSPHERIC TEMPERATURE; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HYDROGEN; HYDROGEN STORAGE; MAGNESIUM PRINTING PLATES; MIXING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INTERMETALLICS; SILICON; THERMAL EVAPORATION; VACUUM; VAPORS; X RAY DIFFRACTION;

PALLADIUM;

EID: 67649262259     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.03.102     Document Type: Article

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