Thin multi-walled carbon nanotubes synthesized by rapid thermal chemical vapor deposition and their field emission properties

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 3, 2009, Pages 2148-2154

  Chun, Kyoung Yong ^a   Jung II, Seung ^b   Choi, Hae Young ^c   Kim, Jong Uk ^c   Lee, CheolJin ^a  

^a Korea University   (South Korea)

^b Hanyang University   (South Korea)

^c Korea Electrotechnology Research Institute (KERI)   (South Korea)

Author keywords

Carbon nanotube; Field emission; RTCVD; Thin MWCNTs

Indexed keywords

APPLIED FIELD; CRYSTALLINITY; EMISSION CURRENT DENSITY; EMISSION STABILITY; FIELD EMISSION PROPERTY; GRAPHENE LAYERS; HIGH PURITY; HIGH TEMPERATURE; LIQUID CATALYST; OUTER DIAMETERS; RAPID THERMAL CHEMICAL VAPOR DEPOSITIONS; RTCVD; SHORT REACTION TIME; THIN MULTI-WALLED CARBON NANOTUBES; THIN MWCNTS; TURN-ON FIELD; UNIFORM DIAMETER; VACUUM CHAMBERS;

AGGLOMERATION; CATALYSIS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; MULTIWALLED CARBON NANOTUBES (MWCN); VAPORS;

CARBON NANOTUBES;

EID: 67649222601     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.023     Document Type: Conference Paper

References (28)

1. T. Natsuki, K. Tantrakarn, and M. Endo, Carbon 42, 39 (2004).
2. M. Motta, Y. L. Li, I. Kinloch, and A. Windle, Nano. Lett. 5, 1529 (2005).
3. A. Koshio, M. Inakuma, Z. W. Wang, T. Sugai, and H. Shinohara, J. Phys. Chem. B 104, 7908 (2000).
4. M. Yudasaka, T. Komatsu, T. Ichihashi, Y. Achiba, and S. Iijima, J. Phys. Chem. B 102, 48926 (1998).
5. H. Hou, A. K. Schaper, F. Weller, and A. Greiner, Chem. Mater. 14, 3990 (2002).
6. P. B. Amama, M. R. Maschmann, T. S. Fisher, and T. D. Sands, J. Phys. Chem. B 110, 10636 (2006).
7. B. C. Liu, S. C. Lyu, T. J. Lee, S. K. Choi, C. Y. Park, and C. J. Lee, Chem. Phys. Lett. 373, 475 (2003).
8. E. H. Hong, K. H. Lee, S. H. Oh, and C. G. Park, Adv. Func. Mat. 13, 961 (2003).
9. T. Hiraoka, S. Bandow, H. Shinohara, and S. Iijima, Carbon 44, 1853 (2006).
10. J.-F. Colomer, C. Stephan, S. Lefrant, G. Van Tendeloo, I. Willems, Z. Konya, A. Fonseca, Ch. Laurent, and J. B. Nagy, Chem. Phys. Lett. 317, 83 (2000).
11. G. Ning, F. Wei, Q. Wen, G. Luo, Y. Wang, and Y Jin, J.Phys. Chem. B 110, 1201 (2006).
12. R. L. Vander Wal , G. M. Berger, and L. J. Hall, J.Phys. Chem. B 106, 3564 (2002).
13. F. Xu, X. Liu, and S. D. Tse, Carbon 44, 570 (2006).
14. E. Flahaut, Ch. Laurent, and A. Peigney, Carbon 43, 375 (2005).
15. Y. A. Kim, T. Hayashi, M. Endo, Y Kaburagi, and S. Tsuruoka, Carbon 43, 2243 (2005).
16. D. Y Kim, C. M. Yang, Y S. Park, K. K. Kim, S. Y. Jeong, J. H. Han, and Y H. Lee, Chem. Phys. Lett. 413, 135 (2005).
17. H. J. Jeong, H. K. Choi, G. Y. Kim, Y. I. Song, Y. Tong, S. C. Lim, and Y. H. Lee, Carbon 44, 2689 (2006).
18. S. I. Jung, S. H. Jo, H. S. Moon, J. M. Kim, D. S. Zang, and C. J. Lee, J. Phys. Chem. C 111, 4175 (2007).
19. M. Su, B. Zheng, and J. Liu, Chem. Phys. Lett. 322, 321 (2000).
20. W. Z. Wang, B. Poudel, D. Z. Wang, and Z. F. Ren, J. Am. Chem. Soc. 127, 18018 (2005).
21. E. Couteau, K. Hernadi, J. W. Seo, L. Thiên-Nga, C. S. Miko, and L. Forro, Chem. Phys. Lett. 378, 9 (2003).
22. S. R. P. Silva, S. Henley, P. Fearon, H. W. Kroto, and D. R. M. Walton, J. Phys. Chem. B 109, 11925 (2005).
23. J. M. Bonard, J. P. Salvetat, T. Stöckli, L. Forro, and A. Châtelain, Appl. Phys. A 69, 245 (1999).
24. P. G. Collins and A. Zettl, Appl. Phys. Lett. 69, 1969 (1996).
25. J. M. Bonard, J. P. Salvetat, T. Stöckli, W. A. de Heer, L. Forro, and A. Châtelain, Appl. Phys. Lett. 73, 918 (1998).
26. W. Zhu, C. Bower, O. Zhou, G. Kochanski, and S. Jin, Appl. Phys. Lett. 75, 873 (1999).
27. R. Seelaboyina, J. Huang, and W. B. Choi, Appl. Phys. Lett. 88, 194104 (2006).
28. C. Qian, H. Qi, B. Gao, Y Cheng, Q. Qiu, L.-C. Qin, O. Zhou, and J. Liu, J. Nanosci. Nanotechnol. 6, 1 (2006).