Fabrication of high- Q polydimethylsiloxane optical microspheres for thermal sensing

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Dong, C H ^a,b   He, L ^a   Xiao, Y F ^a,c   Gaddam, V R ^a   Ozdemir, S K ^a   Han, Z F ^b   Guo, G C ^b   Yang, L ^a  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BLUE SHIFT; HIGHLY SENSITIVE; INPUT POWER; OPTICAL MICROSPHERES; ORDER OF MAGNITUDE; POLYDIMETHYLSILOXANE PDMS; QUALITY FACTORS; RED SHIFT; RESONANCE SHIFT; SILICA MICROSPHERES; TEMPERATURE SENSITIVITY; THERMAL RESOLUTION; THERMAL SENSING; THERMAL SENSORS; WHISPERING GALLERY MODES;

MICROCHANNELS; MICROSPHERES; OPTICAL RESONATORS; OPTICAL SENSORS; SILICA;

SILICONES;

EID: 67649118100     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3152791     Document Type: Article

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