Epilayer control of photodeposited materials during UV photocatalysis

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Takahashi, R ^a,c   Katayama, M ^b,d   Dahl, O ^a,e   Grepstad, J K ^a   Matsumoto, Y ^b   Tybell, T ^a  

^a NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF MARYLAND   (United States)

^d UNIVERSITY OF TOKYO   (Japan)

^e SINTEF MATERIALS AND CHEMISTRY   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSPORT; NB:SRTIO3; OXIDATION AND REDUCTION; OXIDATION REACTIONS; POLAR SURFACES; UV ILLUMINATIONS;

DISTILLATION; EPILAYERS; NIOBIUM; PHOTOCATALYSIS;

OXIDATION;

EID: 67649114389     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3151820     Document Type: Article

References (24)

1. A. Fujishima and K. Honda, Nature (London) 0028-0836 238, 37 (1972). 10.1038/238037a0
2. A. Kudo, R. Nishiro, A. Iwase, and H. Kato, Chem. Phys. 0301-0104 339, 104 (2007). 10.1016/j.chemphys.2007.07.024
3. A. L. Linsebigler, G. Lu, and J. T. Yates, Jr., Chem. Rev. (Washington, D.C.) 95, 735 (1995). 10.1021/cr00035a013 0009-2665
4. A. Sawada and R. Abe, Jpn. J. Appl. Phys. 0021-4922 5, 401 (1966). 10.1143/JJAP.5.401
5. J. L. Giocondi and G. S. Rohrer, Chem. Mater. 0897-4756 13, 241 (2001). 10.1021/cm000890h
6. S. V. Kalinin, D. A. Bonnell, T. Alvarez, X. Lei, Z. Hu, J. H. Ferris, Q. Zhang, and S. Dunn, Nano Lett. 1530-6984 2, 589 (2002). 10.1021/nl025556u
7. S. Dunn, P. M. Jones, and D. E. Gallardo, J. Am. Chem. Soc. 0002-7863 129, 8724 (2007). 10.1021/ja071451n
8. Y. Inoue, K. Sato, and K. Sato, J. Chem. Soc., Faraday Trans. 1 85, 1765 (1989). 10.1039/f19898501765
9. . Dahl, J. K. Grepstad, and T. Tybell, J. Appl. Phys. 0021-8979 103, 114112 (2008). 10.1063/1.2937251
10. R. Takahashi,. Dahl, E. Eberg, J. K. Grepstad, and T. Tybell, J. Appl. Phys. 0021-8979 104, 064109 (2008). 10.1063/1.2978225
11. R. Takahashi, J. K. Grepstad, T. Tybell, and Y. Matsumoto, Appl. Phys. Lett. 0003-6951 92, 112901 (2008). 10.1063/1.2890485
12. K. Ohara, T. Ohsawa, H. Koinuma, and Y. Matsumoto, Jpn. J. Appl. Phys., Part 2 0021-4922 45, L339 (2006). 10.1143/JJAP.45.L339
13. T. Abe, T. Ohsawa, M. Katayama, H. Koinuma, and Y. Matsumoto, Appl. Phys. Lett. 0003-6951 91, 061928 (2007). 10.1063/1.2769937
14. JCPDS Card No. 004-0783.
15. JCPDS Card No. 006-0434.
16. B. E. Breyfogle, R. J. Phillips, and J. A. Switzer, Chem. Mater. 0897-4756 4, 1356 (1992). 10.1021/cm00024a041
17. E. Michailova and A. Milchev, J. Appl. Electrochem. 0021-891X 18, 614 (1988). 10.1007/BF01022259
18. R. Tanaka, M. Katayama, S. Takata, R. Takahashi, J. K. Grepstad, T. Tybell, and Y. Matsumoto (unpublished).
19. Y. Watanabe and M. Okano, Appl. Phys. Lett. 0003-6951 78, 1906 (2001). 10.1063/1.1357807
20. A. G. Chynoweth, J. Appl. Phys. 0021-8979 27, 78 (1956). 10.1063/1.1722201
21. L. Pintilie, I. Vrejoiu, G. Le Rhun, and M. Alexe, J. Appl. Phys. 0021-8979 101, 064109 (2007). 10.1063/1.2560217
22. A. Kholkin, O. Boiarkine, and N. Setter, Appl. Phys. Lett. 0003-6951 72, 130 (1998). 10.1063/1.120663
23. P. Wurfel, I. P. Batra, and J. T. Jacobs, Phys. Rev. Lett. 0031-9007 30, 1218 (1973). 10.1103/PhysRevLett.30.1218
24. CRC Handbook of Chemistry and Physics, 88th ed., edited by, D. R. Lide, (CRC, Boca Raton, 2007).