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Volumn 255, Issue 18, 2009, Pages 7864-7870
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Characterization of copper SERS-active substrates prepared by electrochemical deposition
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Author keywords
Atomic Force Microscopy (AFM); Copper; Electrochemical deposition; Scanning Electron Microscopy (SEM); Surface Enhanced Raman Scattering (SERS)
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
COPPER;
ELECTROCHEMICAL DEPOSITION;
RAMAN SCATTERING;
RAMAN SPECTROSCOPY;
REDUCTION;
SCANNING ELECTRON MICROSCOPY;
SURFACE ROUGHNESS;
SURFACE SCATTERING;
AVERAGE SURFACE ROUGHNESS;
MICROSCOPIC MEASUREMENT;
SERS-ACTIVE SUBSTRATES;
SPECTRAL INTENSITY;
SUBSTRATE PREPARATION;
SURFACE ENHANCED RAMAN SCATTERING (SERS);
SURFACE ENHANCEMENT;
SURFACE NANOSTRUCTURE;
SUBSTRATES;
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EID: 67549084345
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2009.04.152 Document Type: Article |
Times cited : (46)
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References (19)
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