Low adhesion, non-wetting phosphonate self-assembled monolayer films formed on copper oxide surfaces

Ultramicroscopy

Volumn 109, Issue 8, 2009, Pages 1015-1022

  Hoque, E ^a   DeRose, J A ^b   Bhushan, B ^c   Hipps, K W ^a  

^a Washington State University   (United States)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c OHIO STATE UNIVERSITY   (United States)

Author keywords

Corrosion; Friction; Hydrophobic; Inhibitors; Micro nanoelectronic

Indexed keywords

ADHESIVE FORCE; AFM; BIDENTATE BONDS; CU SURFACES; FRICTION COEFFICIENTS; FRICTION FORCE MICROSCOPY; HYDROPHOBIC; INHIBITORS; LOW ADHESION; MICRO/NANOELECTRONIC; NON-WETTING; OCTADECYLPHOSPHONIC ACIDS; OXIDE SURFACE; PHOSPHONATE; SAMS; SELF-ASSEMBLED MONOLAYER FILMS; SESSILE DROPS; STATIC CONTACT ANGLE; XPS; XPS ANALYSIS; XPS DATA;

ACIDS; ACOUSTIC MICROSCOPES; ADHESION; ALKYLATION; ANGLE MEASUREMENT; ASSOCIATIVE STORAGE; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CAMS; CONTACT ANGLE; COPPER; COPPER OXIDES; CORROSION; DYNAMIC POSITIONING; FRICTION; HYDROPHOBICITY; MOLECULES; NANOFLUIDICS; OXIDE FILMS; PERCOLATION (SOLID STATE); SELF ASSEMBLED MONOLAYERS; TRIBOLOGY; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

CORROSION INHIBITORS;

COPPER; COPPER OXIDE; PHOSPHONIC ACID DERIVATIVE; PHOSPHORIC ACID DERIVATIVE;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL BOND; CHEMICAL REACTION; CORROSION; ELECTRONICS; FRICTION; HYDROPHOBICITY; NANOTECHNOLOGY; SURFACE PROPERTY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67449158757     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.03.033     Document Type: Article

References (55)

1. Ulman A. An Introduction to Ultrathin Organic Films: From Langmuir-Blodgett to Self-Assembly (1991), Academic, San Diego, CA
2. Ulman A. Chem. Rev. 96 (1996) 1533
3. Brovelli D., Hähner G., Ruiz L., Hofer R., Textor M., Kraus G., Waldner A., Schlösser J., Oroszlan P., Ehrat M., and Spencer N.D. Langmuir 15 (1999) 4324
4. Hoffmann P.W., Stelzle M., and Rabolt J.F. Langmuir 13 (1997) 1877
5. Allara D.L., and Nuzzo R.G. Langmuir 1 (1985) 45
6. Allara D.L., and Nuzzo R.G. Langmuir 1 (1985) 52
7. Textor M., Ruiz L., Hofer R., Rossi A., Feldmann K., Hähner G., and Spencer N.D. Langmuir 16 (2000) 3257
8. Pellerite M.J., Dunbar T.D., Boardman L.D., and Wood E.J. J. Phys. Chem. B 107 (2003) 11726
9. Liakos I.L., Newman R.C., McAlpine E., and Alexander M.R. Surf. Interface Anal. 36 (2004) 347
10. Hoque E., DeRose J.A., Hoffmann P., Mathieu H.J., Bhushan B., and Cichomski M. J. Chem. Phys. 124 (2006) 174710
11. Hoque E., DeRose J.A., Kulik G., Hoffmann P., Mathieu H.J., and Bhushan B. J. Phys. Chem. B 110 (2006) 10855
12. Hoque E., DeRose J.A., Hoffmann P., Bhushan B., and Mathieu H.J. J. Phys. Chem. C 111 (2007) 3956
13. Kelley T.W., Boardman L.D., Dunbar T.D., Muyres D.V., Pellerite M.J., and Smith T.P. J. Phys. Chem. B 107 (2003) 5877
14. Adolphi B., Jähne E., Busch G., and Cai X. Anal. Bioanal. Chem. 379 (2004) 646
15. Keszthelyi T., Pászti Z., Rigó T., Hakkel O., Telegdi J., and Guczi L. J. Phys. Chem. B 110 (2006) 8707
16. Antonijevic M.M., and Petrovic M.B. Int. J. Electrochem. Sci. 3 (2008) 1
17. Guo W., Chen S., and Ma H. J. Serb. Chem. Soc. 2 (2006) 167
18. John G., and Alsten V. Langmuir 15 (1999) 7605
19. Whelan C.M., Kinsella M., Ho H.M., and Maex K. J. Electrochem. Soc. 151 (2004) B33-B38
20. Tan Y.S., Srinivasan M.P., Pehkonen S.O., and Chooi S.Y.M. J. Vac. Sci. Technol. A 22 (2004) 1917
21. Tremont R., De Jesus-Cardona H., Garcia-Orozco J., Castro R.J., and Cabrera C.R. J. Appl. Electrochem. 30 (2000) 737
22. Skolnik A.M., Hughes W.C., and Augustine B.H. Chem. Educator 5 (2000) 8
23. Laibinis P.E., and Whitesides G.M. J. Am. Chem. Soc. 114 (1992) 9022
24. Rose J.W. Power Energy: Proc. Inst. Mech. Eng. Part A 215 (2002) 115
25. Bhushan B. Springer Handbook of Nanotechnology. second ed (2007), Springer, Heidelberg
26. Tambe N.S., and Bhushan B. Nanotechnology 16 (2005) 1549
27. Bhushan B. Tribology Issues and Opportunities in MEMS (1998), Kluwer Academic Publishers, Dordrecht
28. Bhushan B. J. Vac. Sci. Technol. B 21 (2003) 2262
29. Bhushan B., and Liu H. Nanotechnology 15 (2004) 1785
30. Bhushan B. Nanotribology and Nanomechanics-An Introduction (2005), Springer-Verlag, Heidelberg, Germany
31. Bhushan B. Handbook of Micro/Nano Tribology. second ed (1999), CRC Press, Boca Raton, FL
32. Liu H., and Bhushan B. Ultramicroscopy 97 (2003) 321
33. Ruan J., and Bhushan B. J. Tribol. 116 (1994) 378
34. Moulder J.F., Stickle W.F., Sobol P.E., and Bomben K.D. Handbook of X-ray Photoelectron Spectroscopy (1992), Perkin-Elmer Corporation, Minnesota
35. Fairley N., and Carrick A. The Casa Cookbook: Recipes for XPS Data Processing (2005), Acolyte Science, UK
36. Rosencwaig A., Wertheim G.K., and Guggenheim H. J. Phys. Rev. Lett. 27 (1971) 479
37. Raiker G.N., Gregory J.C., and Peters P.N. Oxid. Met. 42 (1994) 1
38. Hoque E., DeRose J.A., Houriet R., Hoffmann P., and Mathieu H.J. Chem. Matter. 19 (2007) 798
39. Neson A.J., Reynolds J.G., and Roos J.W. J. Vac. Sci. Technol. A 18 (2000) 1072
40. Frost D.C., Ishitani A., and McDowell C.A. Mol. Phys. 24 (1972) 861
41. Du T.B., Luo Y., and Desai V. Microelectron. Eng. 71 (2004) 90
42. D. Briggs, M.P. Seah, Practical Surface Analysis. Auger and X-ray Photoelectron Spectroscopy, second ed., vol. 1, Wiley, New York, 1990.
43. Du T., Tamboli D., Desai V., and Seal S. J. Electrochem. Soc. 151 (2004) G230
44. Hernandez J., Wrschka P., and Oehrlein G.S. J. Electrochem. Soc. 148 (2001) G389
45. Hoque E., DeRose J.A., Hoffmann P., and Mathieu H.J. Surf. Interface Anal. 38 (2006) 62
46. Whelan C.M., Kinsella M., Ho H.M., and Maex K.J. Electrochem. Soc. 151 (2004) B33
47. Gredelj S., Gerson A.R., Kumar S., and Cavallaro G.P. Appl. Surf. Sci. 174 (2001) 240
48. Tamada K., Nagasawa J., Nakanishi F., Abe K., Hara M., Knoll W., Ishida T., Fukushima H., Miyashita S., Usui T., Koini T., and Lee T.R. Thin Solid Films 329 (1998) 150
49. Brukman M.J., Marco G.O., Dunbar T.D., Boardman L.D., and Carpick R.W. Langmuir 22 (2006) 3988
50. Allara D.L., Parikh A.N., and Judge E. J. Chem. Phys. 100 (1994) 1761
51. Fukushima H., Seki S., Nishikawa T., Takiguchi H., Tamada K., Abe K., Colorado R., Graupe Jr. M., Shmakova O.E., and Lee T.R. J. Phys. Chem. B 104 (2000) 7417
52. Bhushan B., and Liu H. Phys. Rev. B 63 (2001) 245412
53. Liu H., and Bhushan B. Ultramicroscopy 91 (2002) 185
54. Bhushan B. Introduction to Tribology (2002), Wiley, New York
55. McDermott M.T., Green J., and Porter M. Langmuir 13 (1997) 2504