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Volumn 15, Issue 1, 2000, Pages 8-10
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Occupational exposure to crystalline silica during tuckpointing and the use of engineering controls
a a
a
NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
POLYVINYLCHLORIDE;
SILICON DIOXIDE;
AIR MONITORING;
AIR SAMPLING;
ARTICLE;
CONTROLLED STUDY;
FILTER;
HUMAN;
INDUSTRIAL HYGIENE;
INDUSTRIAL WORKER;
MINERAL DUST;
OCCUPATIONAL EXPOSURE;
OCCUPATIONAL SAFETY;
PARTICULATE MATTER;
PRIORITY JOURNAL;
SILICOSIS;
WORKPLACE;
CONSTRUCTION MATERIALS;
DUST;
HUMANS;
INDUSTRY;
INHALATION EXPOSURE;
NATIONAL INSTITUTE FOR OCCUPATIONAL SAFETY AND HEALTH;
OCCUPATIONAL EXPOSURE;
REFERENCE VALUES;
SILICON DIOXIDE;
UNITED STATES;
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EID: 6744229754
PISSN: 1047322X
EISSN: None
Source Type: Journal
DOI: 10.1080/104732200301773 Document Type: Note |
Times cited : (16)
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References (5)
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