Accurate measurement and evaluation of the nitrogen depth profile in plasma nitrided iron

Vacuum

Volumn 83, Issue 9, 2009, Pages 1174-1178

  Hosseini, S R ^a,b   Ashrafizadeh, F ^a  

^a ISFAHAN UNIVERSITY OF TECHNOLOGY   (Iran)

^b MALEK ASHTAR UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

GDOES; Nitrogen depth profile; Plasma nitriding; Pure iron; SIMS

Indexed keywords

GDOES; NITROGEN DEPTH PROFILE; PLASMA NITRIDING; PURE IRON; SIMS;

ATOMIC SPECTROSCOPY; CASE HARDENING; DIFFUSION; EMISSION SPECTROSCOPY; GLOW DISCHARGES; MOLECULAR SPECTROSCOPY; NITRIDING; NITROGEN; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MICROSCOPY; PLASMAS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SPACE PROBES; SURFACE TREATMENT;

PLASMA APPLICATIONS;

EID: 67349279805     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.03.006     Document Type: Article

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