TiO2 thin films doped with Pd and Eu for optically and electrically active TOS-Si heterojunction

Optical Materials

Volumn 31, Issue 9, 2009, Pages 1337-1339

  Kaczmarek, Danuta ^a   Domaradzki, Jaroslaw ^a   Prociow, Eugeniusz L ^a   Berlicki, Tadeusz ^a   Prociow, Krystyna ^b  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

Europium; Heterojunction; Palladium; Thin films; TiO2; TOS

Indexed keywords

ENERGY GAP; EUROPIUM; FILM PREPARATION; HETEROJUNCTIONS; INTERFACES (MATERIALS); LIGHT TRANSMISSION; NANOCRYSTALS; OXIDE FILMS; OXIDE MINERALS; OXIDE SEMICONDUCTORS; PALLADIUM; SEMICONDUCTOR DOPING; SUBSTRATES; TERNARY ALLOYS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ELECTRICAL CONDUCTIVITY; FUNDAMENTAL ABSORPTION EDGE; MAGNETRON SPUTTERING METHOD; NANO-CRYSTALLINE STRUCTURES; OPTICAL AND ELECTRICAL CHARACTERIZATION; OPTICAL TRANSMISSION SPECTROSCOPY; TIO2; X-RAY DIFFRACTION MEASUREMENTS;

THIN FILMS;

EID: 67349266227     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2008.10.017     Document Type: Article

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