XPS and AFM surface study of PMMA irradiated by electron beam

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2600-2604

  Nathawat, Rashi ^a   Kumar, Anil ^a   Acharya, N K ^b   Vijay, Y K ^a  

^a UNIVERSITY OF RAJASTHAN   (India)

^b M S UNIVERSITY OF BARODA   (India)

Author keywords

LEE irradiation; PMMA; Roughness; TM AFM; XPS

Indexed keywords

LEE IRRADIATION; PMMA; ROUGHNESS; TM-AFM; XPS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRONS; PHOTORESISTS; RADIATION; SURFACE ROUGHNESS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349169982     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.054     Document Type: Article

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