Fabrication of electrochemically stable fluorinated nano-carbon film compared with other fluorinated carbon materials

Carbon

Volumn 47, Issue 8, 2009, Pages 1943-1952

  Ueda, Akio ^a,b   Kato, Dai ^b   Sekioka, Naoyuki ^b,c   Kamata, Tomoyuki ^d   Kurita, Ryoji ^b   Uetsuka, Hiroshi ^e   Hattori, Yoshiyuki ^f   Hirono, Shigeru ^g   Umemura, Shigeru ^d   Niwa, Osamu ^a,b,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

^d CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

^e Shinshu University ^*  (Japan)

^f SHINSHU UNIVERSITY   (Japan)

^g MES Afty Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON-DOPED DIAMONDS; CAPACITANCE CURRENTS; CARBON MATERIALS; ELECTROCHEMICAL INTERFACES; ELECTRON TRANSFER RATES; FLUORINATED SURFACES; FLUORINATION EFFECTS; FLUORINE CONTENTS; GLASSY CARBONS; LOW OXYGENS; NANO CARBONS; NANO-CRYSTALLINE STRUCTURES; PLASMA TREATMENTS; POLY-CRYSTALLINE; POTENTIAL CYCLES; POTENTIAL WINDOWS; SLOW ELECTRONS; SPUTTERING METHODS;

BORON; CARBON FILMS; CYCLOTRONS; ELECTRON TRANSITIONS; FABRICATION; FLUORINATION; FLUORINE; HALOGENATION; NANOCRYSTALLINE MATERIALS; OXYGEN; PLASMA APPLICATIONS;

ELECTRON CYCLOTRON RESONANCE;

EID: 67349109712     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.03.041     Document Type: Article

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