Fully integrated three-dimensional electrodes for electrochemical detection in microchips: Fabrication, characterization, and applications

Analytical Chemistry

Volumn 81, Issue 12, 2009, Pages 4762-4769

  Pai, Rekha S ^a,c   Walsh, Kevin M ^a   Crain, Mark M ^a   Roussel Jr , Thomas J ^a   Jackson, Douglas J ^a   Baldwin, Richard P ^b   Keynton, Robert S ^a   Naber, John F ^a  

^a University of Louisville   (United States)

^b UNIVERSITY OF LOUISVILLE   (United States)

^c NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3-D ELECTRODES; ACTIVE SURFACE AREA; ANALYTE; ANALYTES; COLLECTION EFFICIENCY; CONTINUOUS-FLOW; DUAL ELECTRODES; ELECTROCHEMICAL DETECTION; FULLY INTEGRATED; HIGH ASPECT RATIO; INTERFERANT; MICRO ANALYTICAL SYSTEMS; MICROFABRICATED; ON CHIPS; PLANAR ELECTRODE; PRE-CONCENTRATION; REDOX CONVERSION; SAMPLE PROCESSING; SILICON MOLDS; STAND -ALONE; STUD-BUMPS; THREE-DIMENSIONAL (3D); THREE-DIMENSIONAL ELECTRODE;

ASPECT RATIO; BRAIN; CARBON NANOTUBES; CONSTRAINED OPTIMIZATION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTROPHORESIS; MICROELECTRODES; MICROFABRICATION; MICROPROCESSOR CHIPS; SUGAR (SUCROSE); SURFACE DEFECTS; THREE DIMENSIONAL;

ELECTROCHEMICAL ELECTRODES;

GOLD; SILICON;

ARTICLE; ELECTROCHEMICAL DETECTION; ELECTROPHORESIS; MICROCHIP ANALYSIS; MICROELECTRODE; THREE DIMENSIONAL IMAGING;

CATECHOLS; DOPAMINE; ELECTRODES; ELECTROPHORESIS, MICROCHIP; GOLD; MICROSCOPY, ELECTRON, SCANNING;

EID: 67249130638     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac9002529     Document Type: Article

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