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Journal of Applied Physics

Volumn 105, Issue 9, 2009, Pages

Filamentation in argon microwave plasma at atmospheric pressure

(5) Cardoso, R P a Belmonte, T a Nol, C a Kosior, F a Henrion, G a

a INSTITUT JEAN LAMOUR (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBED POWER; ARGON PLASMAS; ELECTRON DENSITIES; FILAMENTATION; GAS TEMPERATURE; INCIDENT POWER; MICROFILAMENTS; MICROWAVE CAVITY; MICROWAVE PLASMA; RELATIVE POSITIONS; SPECIFIC VALUES;

ARGON; ATMOSPHERIC PRESSURE; ELECTRIC FIELDS; ELECTRON TEMPERATURE; MICROWAVES;

FILAMENTS (LAMP);

EID: 67249096597 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3125525 Document Type: Article

Times cited : (29)

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