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Volumn 517, Issue 20, 2009, Pages 5837-5843
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Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering
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Author keywords
Atomic force microscopy; Direct current magnetron sputtering; Radio frequency modulated plasma; Scanning electron microscopy; Sputtering; Thin films; Titanium; X ray diffraction
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Indexed keywords
COLUMNAR STRUCTURES;
CONVENTIONAL DC MAGNETRON SPUTTERING;
CROSS-SECTIONAL SCANNING ELECTRON MICROSCOPIES;
CRYSTALLINITY;
DC SPUTTERING;
DIRECT CURRENT MAGNETRON SPUTTERING;
DISCHARGE PRESSURES;
ENERGY LOSS;
FILM DENSITY;
FILM STRUCTURE;
GROWING FILMS;
HIGH PRESSURE;
INDUCTIVELY-COUPLED;
ION ENERGIES;
ION FRACTION;
PRESSURE RANGES;
PULSED DC;
PULSED DC MAGNETRON SPUTTERING;
PULSED DC SPUTTERING;
RADIO FREQUENCY MODULATED PLASMA;
RADIO FREQUENCY PLASMA;
RF DISCHARGE;
RF PLASMA;
STRUCTURE AND PROPERTIES;
TI FILM;
ATOMIC FORCE MICROSCOPY;
ATOMS;
DIFFRACTION;
ELECTRON MICROSCOPES;
ENERGY DISSIPATION;
FREQUENCY MODULATION;
MAGNETRON SPUTTERING;
MAGNETRONS;
PHOTORESISTS;
PLASMA THEORY;
RADIO;
RADIO WAVES;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SURFACE DISCHARGES;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
THIN FILMS;
TITANIUM;
WAVE PLASMA INTERACTIONS;
X RAY DIFFRACTION;
PLASMA DEPOSITION;
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EID: 66949162547
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.03.055 Document Type: Article |
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Times cited : (23)
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References (12)
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