Design ranking and analysis methodology for standard cells and full chip physical optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7275, Issue , 2009, Pages

  Vaserman, Yosi ^a   Shauly, Eitan ^a  

^a Tower Semiconductor ^*  (Israel)

Author keywords

Design ranking; DFM; DFM metrics; Yield scoring

Indexed keywords

ANALYSIS SYSTEM; CHIP DESIGN; CODING METHODS; COMPLEX DESIGNS; DEEP SUB-MICRON; DESIGN RULES; DFM; DFM METRICS; LAYOUT MODIFICATION; LAYOUT OPTIMIZATION; OVERALL DESIGN; PHYSICAL LAYOUT; RELIABILITY PERFORMANCE; SET OF RULES; STANDARD CELL; YIELD SCORING;

ELECTRIC BATTERIES; FOUNDRY PRACTICE; MACHINE DESIGN; STANDARDS;

CELL MEMBRANES;

EID: 66749190463     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.812972     Document Type: Conference Paper

References (8)

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