Masked ion beam irradiation of high-temperature superconductors: Patterning of nano-size regions with high point-defect density

International Journal of Nanotechnology

Volumn 6, Issue 7-8, 2009, Pages 704-714

  Lang, W ^a   Richter, H ^a   Marksteiner, M ^a   Siraj, K ^b   Bodea, M A ^b   Pedarnig, J D ^b   Grigoropoulos, C ^b,c   Bauerle D ^b   Hasenfuss, C ^b   Palmetshofer, L ^b   Kolarova, R ^b   Bauer, P ^b  

^a UNIVERSITY OF VIENNA   (Austria)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Electrical resistivity; Hall effect.; High temperature superconductors; Masked ion irradiational; Nanopatterning; Point defects

Indexed keywords

BARIUM COMPOUNDS; COPPER COMPOUNDS; ELECTRIC CONDUCTIVITY; HALL EFFECT; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HIGH TEMPERATURE SUPERCONDUCTORS; ION BEAMS; ION BOMBARDMENT; NANOSTRUCTURES; POINT DEFECTS; SCANNING ELECTRON MICROSCOPY; THICK FILMS; THIN FILMS; YTTRIUM BARIUM COPPER OXIDES;

COLLISION CASCADE; ELECTRICAL TRANSPORT PROPERTIES; EXPERIMENTAL TEST; ION BEAM IRRADIATION; MASKED ION IRRADIATIONAL; NANOPATTERNING; TARGET MATERIALS; YBA2CU3O7 THIN FILM;

IONS;

EID: 66749107409     PISSN: 14757435     EISSN: None     Source Type: Journal    
DOI: 10.1504/IJNT.2009.025308     Document Type: Article

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