Stress relaxation via addition fragmentation chain transfer in a thiol-ene photopolymerization

Macromolecules

Volumn 42, Issue 7, 2009, Pages 2551-2556

  Kloxin, J Christopher ^a   Scott, F Timothy ^a   Bowman, N Christopher ^a  

^a University of Colorado   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION-FRAGMENTATION; ALLYL SULFIDE; CHAIN TRANSFER; CROSS-LINKED NETWORKS; DOMINANT MECHANISM; INITIAL STRESS; IRRADIATION INTENSITY; LOW STRESS; NETWORK ADAPTATION; POLYMERIZATION RATES; POLYMERIZATION REACTION; SHRINKAGE STRESS; STRESS EVOLUTION; THIOL-ENE; THIOL-ENE PHOTOPOLYMERIZATION; THIYL RADICALS;

FUNCTIONAL GROUPS; FUNCTIONAL POLYMERS; PHOTOPOLYMERIZATION; POLYMERS; RESIDUAL STRESSES; SHRINKAGE; STRESS RELAXATION;

FREE RADICAL POLYMERIZATION;

EID: 66649099932     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma802771b     Document Type: Article

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