Compact microwave re-entrant cavity applicator for plasma-assisted combustion

Review of Scientific Instruments

Volumn 80, Issue 5, 2009, Pages

  Hemawan, Kadek W ^a   Wichman, Indrek S ^a   Lee, Tonghun ^a   Grotjohn, Timothy A ^a,b   Asmussen, Jes ^a,b  

^a Michigan State University   (United States)

^b Fraunhofer Center for Coatings and Laser Applications   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY APPLICATORS; ELECTROMAGNETIC ENERGY; FLAME LENGTH; FLAMMABILITY LIMITS; FUEL-LEAN CONDITIONS; GAS TEMPERATURE; HIGH ELECTRIC FIELDS; INPUT POWER; MICRO-PLASMA DISCHARGES; MICROWAVE POWER; NUMBER DENSITY; PREMIXED; PREMIXED COMBUSTION; RADICAL SPECIES; ROTATIONAL TEMPERATURE;

APPLICATORS; ATMOSPHERIC PRESSURE; ATOMIC SPECTROSCOPY; ELECTRIC DISCHARGES; ELECTRIC FIELDS; EMISSION SPECTROSCOPY; FLAMMABILITY; LEAKAGE (FLUID); MICROWAVES; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; THERMOCHEMISTRY;

COMBUSTION;

EID: 66549127406     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3131623     Document Type: Article

References (31)

1. S. M. Lee, C. S. Park, M. S. Cha, and S. H. Chung, IEEE Trans. Plasma Sci. 0093-3813 33, 1703 (2005). 10.1109/TPS.2005.845266
2. S. D. T. Axford, J. M. Goodings, and A. N. Hayhurst, Combust. Flame 0010-2180 114, 294 (1998). 10.1016/S0010-2180(97)00321-0
3. N. Chintala, A. Bao, G. Lou, and I. V. Adamovich, Combust. Flame 0010-2180 144, 744 (2006). 10.1016/j.combustflame.2005.08.040
4. L. Bromberg, D. R. Cohn, A. Rabinovich, and N. Alexeev, Int. J. Hydrogen Energy 0360-3199 24, 1131 (1999). 10.1016/S0360-3199(98)00178-5
5. L. A. Rosocha, D. M. Coates, D. Platts, and S. Stange, Phys. Plasmas 1070-664X 11, 2950 (2004). 10.1063/1.1688788
6. S. Stange, Y. Kim, V. Ferreri, L. A. Rosocha, and D. M. Coates, IEEE Trans. Plasma Sci. 0093-3813 33, 316 (2005). 10.1109/TPS.2005.845940
7. M. S. Cha, S. M. Lee, K. T. Kim, and S. H. Chung, Combust. Flame 0010-2180 141, 438 (2005). 10.1016/j.combustflame.2005.02.002
8. F. Wang, J. B. Liu, J. Sinibaldi, C. Brophy, A. Kuthi, C. Jiang, P. Ronney, and M. A. Gundersen, IEEE Trans. Plasma Sci. 0093-3813 33, 844 (2005). 10.1109/TPS.2005.845251
9. S. M. Starikovskaia, J. Phys. D 0022-3727 39, R265 (2006). 10.1088/0022-3727/39/16/R01
10. M. A. V. Ward, J. Microwave Power 0022-2739 12, 187 (1977).
11. M. A. V. Ward, J. Microwave Power 0022-2739 14, 241 (1979).
12. C. S. MacLatchy, R. M. Clements, and P. R. Smy, Combust. Flame 0010-2180 45, 161 (1982). 10.1016/0010-2180(82)90042-6
13. E. G. Groff and M. K. Krage, Combust. Flame 0010-2180 56, 293 (1984). 10.1016/0010-2180(84)90063-4
14. S. F. Mertz, J. Asmussen, and M. C. Hawley, IEEE Trans. Plasma Sci. 0093-3813 2, 297 (1974). 10.1109/TPS.1974.4316854
15. A. I. Babaritskii, I. E. Baranov, and M. B. Bibikov, High Energy Chem. 0018-1439 38, 407 (2004). 10.1023/B:HIEC.0000048240.92448.f2
16. S. B. Leonov and D. A. Yarantsev, AIAA 2006-563 (2006).
17. S. H. Zaidi, E. Stickman, X. Qin, Z. Zhao, S. Macheret, Y. Ju, and R. B. Miles, AIAA 2006-1217 (2006).
18. K. W. Hemawan, C. L. Romel, S. Zuo, I. S. Wichman, T. A. Grotjohn, and J. Asmussen, Appl. Phys. Lett. 0003-6951 89, 141501 (2006). 10.1063/1.2358213
19. J. Asmussen, H. H. Lin, B. Manring, and R. Fritz, Rev. Sci. Instrum. 0034-6748 58, 1477 (1987). 10.1063/1.1139384
20. R. M. Fredericks and J. Asmussen, J. Appl. Phys. 0021-8979 42, 3647 (1971). 10.1063/1.1660786
21. J. Asmussen, T. A. Grotjohn, T. Schuelke, M. Becker, M. Yaran, D. King, S. Wicklein, and D. K. Reinhard, Appl. Phys. Lett. 0003-6951 93, 031502 (2008). 10.1063/1.2961016
22. J. Rogers and J. Asmussen, IEEE Trans. Plasma Sci. 0093-3813 10, 11 (1982). 10.1109/TPS.1982.4316127
23. J. Asmussen, R. Mallavarpu, J. R. Hamann, and H. C. Park, Proc. IEEE 0018-9219 62, 109 (1974). 10.1109/PROC.1974.9391
24. J. Root and J. Asmussen, Rev. Sci. Instrum. 0034-6748 56, 1511 (1985). 10.1063/1.1138146
25. S. Whitehair, J. Asmussen, and S. Nakanishi, J. Propul. Power 0748-4658 3, 136 (1987). 10.2514/3.22965
26. L. Mahoney, M. Dahimene, and J. Asmussen, Rev. Sci. Instrum. 0034-6748 59, 448 (1988). 10.1063/1.1139858
27. A. Kono, T. Sugryama, T. Goto, H. Furuhashi, and Y. Uchaid, Jpn. J. Appl. Phys., Part 2 0021-4922 40, L238 (2001). 10.1143/JJAP.40.L238
28. A. Kono, T. Shibata, and A. Aramaki, Jpn. J. Appl. Phys., Part 1 0021-4922 45, 940 (2006). 10.1143/JJAP.45.940
29. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994) p. 339.
30. J. S. Kim and M. A. Cappelli, J. Appl. Phys. 84, 4595 (1998). 10.1063/1.368685
31. B. Ranganath and T. Echekki, Int. J. Heat Mass Transfer 0017-9310 49, 5075 (2006). 10.1016/j.ijheatmasstransfer.2006.05.029