Enhancement of antiferromagnetic coupling in magnetic multilayers by low energy ion beam substrate nanopatterning

Journal of Physics Condensed Matter

Volumn 21, Issue 22, 2009, Pages

  Quiros C ^a   Peverini, L ^b   Zrate, L ^a   Alija, A ^a   Diaz J ^a   Velez M ^a   Rodriguez Rodriguez G ^a,c   Fauth, F ^b   Ziegler, E ^b   Alameda, J M ^a  

^a CINN CSIC UNIOVI PA   (Spain)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c INSTITUTO NACIONAL DEL CARBÓN   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC ALIGNMENT; ANTIFERROMAGNETIC COUPLING; CO-SI ALLOY; DIPOLAR INTERACTION; EXCHANGE BIAS; INTERLAYER EXCHANGE COUPLING; ION BEAM EXPOSURE; ION BEAM IRRADIATION; LOCAL COMPOSITIONS; LOW ENERGY ION BEAM; MAGNETIC DOMAIN STRUCTURES; MAGNETIC PROPERTIES OF THIN FILMS; MAGNETIC REGION; NANOPATTERNING; NEW RESULTS; NONMAGNETIC; ORDER OF MAGNITUDE; ROOM TEMPERATURE; SI (100) SUBSTRATE; SMALL FLUCTUATION; SUBSTRATE ROUGHNESS;

AMORPHOUS SILICON; ANTIFERROELECTRICITY; ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; BEAM PLASMA INTERACTIONS; CURIE TEMPERATURE; FILM PREPARATION; ION BEAMS; ION BOMBARDMENT; IONS; MAGNETIC ANISOTROPY; MAGNETIC DOMAINS; MAGNETIC FILMS; MAGNETIZATION REVERSAL; SILICIDES; SILICON ALLOYS; SUBSTRATES; SUPERPARAMAGNETISM; SURFACE DIFFUSION;

MAGNETIC MULTILAYERS;

EID: 66349087608     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/22/224024     Document Type: Article

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