Spatiotemporal powder formation and trapping in radio frequency silane plasmas using two-dimensional polarization-sensitive laser scattering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 13, Issue 3, 1995, Pages 918-926

  Dorier, J L ^a   Hollenstein, C H ^a   Howling, A A ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; CHARGE-COUPLED DEVICE CAMERA; CONSISTENT ESTIMATION; COULOMB COUPLINGS; CROSS SECTION; DISCHARGE VOLUME; EXPERIMENTAL DATA; LARGE REGIONS; LASER SCATTERING; NUMBER DENSITY; PARALLEL PLATE CAPACITORS; PARTICLE GROWTH; PLASMA EMISSION; POLARIZED BEAMS; POWDER FORMATION; POWDER LAYER; RADIO FREQUENCIES; RADIO FREQUENCY DISCHARGES; RF DISCHARGE; SCATTERED LIGHT; SILANE PLASMAS; SPATIAL SIZE; STEADY-STATE CONDITION;

ARGON; DYNAMICS; LIGHT SCATTERING; MOBILE TELECOMMUNICATION SYSTEMS; PLASMA DEPOSITION; PLASMAS; POLARIZATION; POWDERS; RADIO; RADIO WAVES; SILANES;

ELECTRIC DISCHARGES;

EID: 65949113812     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579852     Document Type: Article

References (49)

1. G. S. Selwyn, J. E. Heidenreich, and K. L. Haller, J. Vac. Sci. Technol. A 9, 2817 (1991);
2. G.S. Selwyn, Semicond. Int. 16, 72 (1993).
3. N. Braithwaite and B. Graham, New Sci. 190, 34 (1993);
4. A. Bouchoule, Phys. World 6, 47 (1993).
5. P. Ho, R. S. Buss, and R. E. Loehman J. Mater. Res. 4, 973 (1989);
6. H. Anderson, T. T. Kodas, and D. M. Smith, Ceram. Bull. 68, 996 (1989).
7. J. Perrin and J. P. M. Schmitt, Proceedings of the 11th European Photovoltaic Solar Energy Conference, edited by L. Gimaraes et. al. (Harwood, Coire, Switzerland, 1992), p. 80.
8. S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
9. See papers in NATO Advanced Research Workshop on Formation, Transport and Consequences of Particles in Plasmas [Plasma Sources Sci. Technol. 3, 239 (1994)].
10. See papers in Special Issue on Charged Dust in Plasmas[IEEE Trans. Plasma Sci. PS-22, 89 (1994)].
11. J. E. Daugherty, R. K. Porteous, M. D. Kilgore, and D. B. Graves, J. Appl. Phys. 72, 3934 (1992).
12. R. N. Nowlin and R. N. Carlile, J. Vac. Sci. Technol. A 9, 2825 (1991).
13. S. J. Choi and M. J. Kushner, J. Appl. Phys. 75, 3351 (1994); Appl. Phys. Lett. 62, 2197 (1993).
14. T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1992).
15. M. S. Barnes, J. H. Keller, J. C. Forster, J. A. O’Neill, and D. K. Coultas, Phys. Rev. Lett. 68, 313 (1992).
16. J. E. Daugherty, R. K. Porteous, and D. B. Graves, J. Appl. Phys. 73, 1617 (1993).
17. M. D. Kilgore, J. E. Daugherty, R. K. Porteous, and D. B. Graves, J. Appl. Phys. 73, 7195 (1993).
18. M. J. McCaughey and M. J. Kushner, J. Appl. Phys. 69, 6952 (1991).
19. J.-P. Boeuf and Ph. Belenguer, J. Appl. Phys. 71, 4751, (1992);
20. J. P. Boeuf, Phys. Rev. A 46, 7910 (1992).
21. H. Ikesi, Phys. Fluids 29, 1764 (1986).
22. J.-P. Boeuf, Ph. Belenguer, and T. Hbid, Proceedings of the 21st International Conference on Phenomena in Ionised Gases, Bochum, Germany, 1993 (unpublished), p. 108; also, in Ref. 6.
23. H. Kausche and R. D. Plattner, in Ref. 4, p. 195.
24. G. M. Jellum, J. E. Daugherty, and D. B. Graves, J. Appl. Phys. 69, 6923 (1991).
25. R. N. Carlile, J. F. O’Hanlon, L. M. Hong, M. P. Garrity, and S. M. Collins, in Ref. 6.
26. K. G. Spears, T. J. Robinson, and R. M. Roth, IEEE Trans. Plasma Sci. PS-14, 179 (1986).
27. A. Bouchoule, A. Plain, L. Boufendi, J.-P. Blondeau, and C. Laure, J. Appl. Phys. 70, 1991 (1991).
28. L. Boufendi, A. Plain, J.-P. Blondeau, A. Bouchoule, C. Laure, and M. Toogood, Appl. Phys. Lett. 60, 169 (1992).
29. G. M. Jellum and D. B. Graves, Appl. Phys. Lett. 57, 2077 (1990).
30. G. Spears, R. P. Kampf, and T. J. Robinson, J. Phys. Chem. 92, 5297 (1988).
31. Ch. Hollenstein, J.-L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling, in Ref. 6.
32. Y. Watanabe and M. Shiratani, in Ref. 6.
33. L. Boufendi and A. Bouchoule, in Ref. 6.
34. W. Bö;hme, W. E. Köhler, M. Römheld, S. Veprek, and R. J. Seebök, in Ref. 7.
35. C. F. Bohren and D. R. Huffman, Absorption and Scattering of Light by Small Particles Wiley, New York, 1983
36. A. A. Howling, Ch. Hollenstein, and P.-J. Paris, Appl. Phys. Lett. 59, 1409 (1991)
37. R. J. Seeböck, W. Böhme, W. E. Köhler, M. Römheld, and S. Veprek, in Ref. 6.
38. S. G. Geha, R. N. Carlile, J. F. O’Hanlon, and G. S. Selwyn, J. Appl. Phys. 72, 374 (1992)
39. A. Garscadden, Proceedings of the 20th International Conference in Ionised Gases, Pisa, 1991 (unpublished), p. 147;
40. A. Garscadden, in Ref. 6.
41. A. Bouchoule and L. Boufendi, in Ref. 6.
42. J. H. Chu, J.-B. Du, and I. Lin, J. Phys. D: Appl. Phys. 27, 296 (1994)
43. A. R. Forouhi, Properties of Amorphous Silicon, EMIS Datareviews Ser. 1 (INSPEC, London, 1989), p. 315.
44. D. B. Graves, J. E. Daugherty, M. D. Kilgore, and R. K. Porteous, in Ref. 6;
45. J. E. Daugherty and D. B. Graves, J. Vac. Sci. Technol. A 11, 1126 (1993)
46. T. Hbid and J.-P. Boeuf (private communication)
47. M. Dalvie, G. S. Selwyn, M. Surenda, C. R. Guarnieri, and J. J. McGill, Appl. Phys. Lett. 63, 3279 (1993)
48. J. Perrin, C. Böhm, R. Etemadi, and A. Lloret, in Ref. 6, and references therein.
49. R. Rompe and M. Steenbeck, Progress in Plasmas and Gas Electronics (Akademie, Berlin, 1975), Vol. 1.