CD uniformity improvement for double-patterning lithography (Litho-Litho-Etch) using freezing process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Sugimachi, Hisanori ^a   Kosugi, Hitoshi ^a   Shibata, Tsuyoshi ^a   Kitano, Junichi ^a   Fujiwara, Koichi ^b   Itou, Kouji ^b   Mita, Michihiro ^b   Soyano, Akimasa ^b   Kusumoto, Shiro ^b   Shima, Motoyuki ^b   Yamaguchi, Yoshikazu ^b  

^a TOKYO ELECTRON LTD   (Japan)

^b JSR CORPORATION   (Japan)

Author keywords

Double patterning; Freezing; Litho Litho Etch

Indexed keywords

CD UNIFORMITY; CD VARIATION; CRITICAL DIMENSION VARIATIONS; DOUBLE-PATTERNING; FREEZING PROCESS; LITHO PROCESS; LITHO-LITHO-ETCH; LITHOGRAPHY PROCESS; OPTIMUM CONDITIONS; PATTERNING TECHNOLOGY; RESIST PATTERN;

DATA STORAGE EQUIPMENT; LITHOGRAPHY; PHOTORESISTS;

FREEZING;

EID: 65849518573     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814033     Document Type: Conference Paper

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