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Volumn 311, Issue 10, 2009, Pages 2867-2874
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Growth and properties of semi-polar GaN on a patterned silicon substrate
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Author keywords
A3. Metalorganic vapor phase epitaxy; A3. Selective epitaxy; B1. Light emitting diodes; B1. Nitrides
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Indexed keywords
A3. METALORGANIC VAPOR PHASE EPITAXY;
A3. SELECTIVE EPITAXY;
ACCEPTOR LEVELS;
ATOMIC CONFIGURATION;
B1. LIGHT EMITTING DIODES;
B1. NITRIDES;
C-DOPED;
EPITAXIAL LATERAL OVERGROWTH;
ETCHING METHOD;
GAN LAYERS;
METAL-ORGANIC VAPOR PHASE EPITAXY;
OPTICAL AND ELECTRICAL PROPERTIES;
P-TYPE;
PATTERNED SILICON;
SELECTIVE AREA GROWTH;
SI SUBSTRATES;
DIODES;
ELECTRIC PROPERTIES;
EPITAXIAL GROWTH;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
LIGHT EMISSION;
LIGHT EMITTING DIODES;
LIGHT SOURCES;
ORGANIC LIGHT EMITTING DIODES (OLED);
PHYSICAL OPTICS;
SEMICONDUCTING GALLIUM;
SILICON;
SUBSTRATES;
VAPORS;
WATER ANALYSIS;
METALLORGANIC VAPOR PHASE EPITAXY;
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EID: 65749113691
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.01.032 Document Type: Article |
Times cited : (79)
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References (25)
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