The oxidation of metal-capped Co cluster films under ambient conditions

Nanotechnology

Volumn 20, Issue 8, 2009, Pages

  De Toro, J A ^a   Andres J P ^a   Gonzalez J A ^a   Muiz P ^a   Riveiro, J M ^a  

^a UNIVERSITY OF CASTILLA LA MANCHA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; CLUSTER FILMS; CO CLUSTERS; CO DEPOSITIONS; CO-CLUSTER FILMS; CU FILMS; GAS-PHASE CONDENSATIONS; HIGH POROSITIES; MAGNETIC CHARACTERS; RADIO-FREQUENCY SPUTTERING; TIME-SCALE;

COBALT COMPOUNDS; COPPER; FILM PREPARATION; OXIDATION; SATURATION MAGNETIZATION; SODIUM COMPOUNDS; THERMAL EVAPORATION;

COBALT;

COBALT; COPPER; TITANIUM; NANOMATERIAL;

ARTICLE; ENVIRONMENTAL TEMPERATURE; MATERIAL COATING; OXIDATION KINETICS; POROSITY; PRIORITY JOURNAL; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; OXIDATION REDUCTION REACTION; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

COBALT; COPPER; CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; OXIDATION-REDUCTION; PARTICLE SIZE; SURFACE PROPERTIES; TITANIUM;

EID: 65549171578     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/8/085710     Document Type: Article

References (19)

1. Gonella F and Mazzoldi P 2000 Handbook of Nanostructured Materials and Nanotechnology vol 4 (California: Academic)
2. Pankhurst Q A, Connolly J, Jones S K and Dobson J 2003 J. Phys. D: Appl. Phys. 36 R167
3. Serrano-Guisan S, Di Domenicantonio G, Abid M, Abid J-P, Hillenkamp M, Gravier L, Ansermet J-P and Félix C 2006 Nat. Mater. 5 730
4. Skumryev V, Stoyanov S, Zhang Y, Hadjipanayis G, Givord D and Nogués J 2003 Nature 423 850
5. Lu A H, Salabas E L and Schüth F 2007 Angew. Chem. Int. Edn 46 1222
6. Binns C et al 2005 J. Phys. D: Appl. Phys. 38 R357
7. Koch S A, Palasantzas G, Vystavel T, De Hosson J T M, Binns C and Louch S 2005 Phys. Rev. B 71 085410
8. Meldrim J M, Qiang Y, Liu Y, Haberland H and Sellmyer D J 2000 J. Appl. Phys. 87 7013
9. Hillenkamp M, Di Domenicantonio G, Eugster O and Félix C 2007 Nanotechnology 18 015702
10. Wang C M, Baer D R, Amonette J E, Engelhard M H, Qiang Y and Antony J 2007 Nanotechnology 18 255603
11. Morel R, Brenac A, Portemont C, Deutsch T and Notin L 2007 J. Magn. Magn. Mater. 308 296
12. Hansen M F and Morup S 1998 J. Magn. Magn. Mater. 184 262
13. Riveiro J M, De Toro J A, Andres J P, Gonzalez J A, Munoz T and Goff J P 2005 Appl. Phys. Lett. 86 172503
14. De Toro J A, Andres J P, Gonzalez J A, Muniz P, Munoz T, Normile P S and Riveiro J M 2006 Phys. Rev. B 73 094449
15. Smardz L, Kobler U and Zinn W 1992 J. Appl. Phys. 71 5199
16. Smith D L 1995 Thin Film Deposition: Principles and Practice (New York: McGraw-Hill) chapter 5
17. Nogués J, Sort J, Langlais V, Skumryev V, Surĩach S, Mũoz J S and Baró M D 2005 Phys. Rep. 422 65
18. González J A, Andrés J P, De Toro J A, Mũiz P, Mũoz T, Crisan O, Binns C and Riveiro J M 2009 J. Nanop. Res. at press (doi:10.1007/s11051-008-9576-8)
19. Xu Y H and Wang J P 2008 Adv. Mater. 20 994