Electron beam lithography of hybrid sol-gel negative resist

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 745-748

  Della Giustina, G ^a   Prasciolu, M ^b   Brusatin, G ^a   Guglielmi, M ^a   Romanato, F ^a,b,c  

^a UNIVERSITY OF PADOVA   (Italy)

^b LABORATORIO TASC   (Italy)

^c LaNN   (Italy)

Author keywords

Electron beam lithography; Epoxy; Glycidoxypropyltrimethoxysilane; Hybrid organic inorganic materials; Sol gel

Indexed keywords

EPOXY; FABRICATION PROCESS; FUNCTIONAL PROPERTIES; GLYCIDOXYPROPYLTRIMETHOXYSILANE; HYBRID ORGANIC-INORGANIC MATERIALS; HYBRID SOL-GEL MATERIALS; HYBRID SOL-GELS; MULTI STEPS; NANOFABRICATION PROCESS; NANOFABRICATION TECHNIQUES; PHOTONIC NANOSTRUCTURES;

ELECTRON BEAMS; GELATION; GELS; HYBRID MATERIALS; MECHANICAL PROPERTIES; NANOTECHNOLOGY; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS;

ELECTRON BEAM LITHOGRAPHY;

EID: 65549161759     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.044     Document Type: Article

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