Nanoscale patterning of ionic self-assembled multilayers

Nanotechnology

Volumn 20, Issue 15, 2009, Pages

  Tulpar, Aysen ^a   Wang, Zhiyong ^b,c   Jang, Chang Hyun ^a   Jain, Vaibhav ^a   Heflin, James R ^a   Ducker, William A ^a,d  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b State University   (United States)

^c GE GLOBAL RESEARCH   (United States)

^d UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ATOMIC-FORCE MICROSCOPIES; BI LAYERS; COOH GROUPS; IN-SITU; LINE WIDTHS; NANO FABRICATIONS; NANO-SCALE PATTERNING; NANO-STRUCTURED; NANOGRAFTING; OH GROUPS; PRECISE CONTROLS; SELF-ASSEMBLED MULTILAYERS; SURFACE GROUPS; TEMPLATED GROWTHS; THREE DIMENSIONS;

ATOMIC FORCE MICROSCOPY; DESORPTION; LITHOGRAPHY;

MULTILAYERS;

NANOFILM; THIOL;

ACCURACY; ARTICLE; ATOMIC FORCE MICROSCOPY; BILAYER MEMBRANE; CHEMICAL STRUCTURE; CONTROLLED STUDY; DESORPTION; MASK; NANOFABRICATION; PARTICLE SIZE; PRIORITY JOURNAL; STEREOCHEMISTRY;

EID: 65549122997     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/15/155301     Document Type: Article

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