Enhancement of the magnetic field sensitivity in Al2 O3 encapsulated NiFe films with anisotropic magnetoresistance

Applied Physics Letters

Volumn 94, Issue 16, 2009, Pages

  Ding, Lei ^a   Teng, Jiao ^a   Zhan, Qian ^a   Feng, Chun ^a   Li, Ming Hua ^a   Han, Gang ^a   Wang, Li Jin ^a   Yu, Guang Hua ^a   Wang, Shu Yun ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC MAGNETORESISTANCES; COLUMNAR GRAINS; CONDUCTION ELECTRONS; MAGNETIC DEAD LAYERS; MAGNETIC FIELD SENSITIVITIES; NI-FE FILMS; SPECULAR REFLECTIONS; SPIN VALVES;

ANISOTROPY; ELECTRIC RESISTANCE; MAGNETIC FIELD EFFECTS; MAGNETOELECTRONICS; MAGNETORESISTANCE; TANTALUM;

OZONE WATER TREATMENT;

EID: 65449116056     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3123807     Document Type: Article

References (17)

1. M. R. Fitzsimmons, T. J. Silva, and T. M. Crawford, Phys. Rev. B 0163-1829 73, 014420 (2006). 10.1103/PhysRevB.73.014420
2. J. Fassbender, J. von Borany, A. Mucklich, K. Potzger, W. Moller, J. McCord, L. Schultz, and R. Mattheis, Phys. Rev. B 0163-1829 73, 184410 (2006). 10.1103/PhysRevB.73.184410
3. N. Amos, R. Fernandez, R. Ikkawi, B. Lee, A. Lavrenov, A. Krichevsky, D. Litvinov, and S. Khizroev, J. Appl. Phys. 0021-8979 103, 07E732 (2008). 10.1063/1.2835441
4. T. R. McGuire and R. I. Potter, IEEE Trans. Magn. 0018-9464 11, 1018 (1975). 10.1109/TMAG.1975.1058782
5. S. H. Li, M. L. Yan, C. T. Yu, and W. Y. Lai, J. Appl. Phys. 0021-8979 75, 6504 (1994). 10.1063/1.356951
6. W. Y. Lee, M. F. Toney, and D. Mauri, IEEE Trans. Magn. 0018-9464 36, 381 (2000). 10.1109/20.822551
7. W. Y. Lee, M. F. Toney, P. Tameerug, E. Allen, and D. Mauri, J. Appl. Phys. 0021-8979 87, 6992 (2000). 10.1063/1.372908
8. B. Dieny, M. Li, S. H. Liao, C. Horng, and K. Ju, J. Appl. Phys. 0021-8979 88, 4140 (2000). 10.1063/1.1310189
9. H. Funaki, S. Okamoto, O. Kitakami, and Y. Shimada, Jpn. J. Appl. Phys., Part 2 0021-4922 33, L1304 (1994). 10.1143/JJAP.33.L1304
10. G. H. Yu, H. C. Zhao, M. H. Li, F. W. Zhu, and W. Y. Lai, Appl. Phys. Lett. 0003-6951 80, 455 (2002). 10.1063/1.1433913
11. H. Gong, D. Litvinov, T. J. Klemmer, D. N. Lambeth, and J. K. Howard, IEEE Trans. Magn. 0018-9464 36, 2963 (2000). 10.1109/20.908642
12. J. Hong, K. Noma, E. Kanda, and H. Kanai, Appl. Phys. Lett. 0003-6951 83, 960 (2003). 10.1063/1.1597751
13. T. Lin and D. Mauri, Appl. Phys. Lett. 0003-6951 78, 2181 (2001). 10.1063/1.1361103
14. C. Y. You, A. Cerezo, P. H. Clifton, L. Folks, M. J. Carey, and A. K. Petford-Long, Appl. Phys. Lett. 0003-6951 91, 011905 (2007). 10.1063/1.2754364
15. L. Wang, J. J. Qiu, W. J. McMahon, K. B. Li, and Y. H. Wu, Phys. Rev. B 0163-1829 69, 214402 (2004). 10.1103/PhysRevB.69.214402
16. T. Miyazaki, T. Ajima, and F. Sato, J. Magn. Magn. Mater. 0304-8853 81, 86 (1989). 10.1016/0304-8853(89)90232-1
17. T. G. S. M. Rijks, R. L. H. Sour, D. G. Neerinck, A. E. M. De Veirman, R. Coehoorn, J. C. S. Kools, M. F. Gillies, and W. J. M. de Jonge, IEEE Trans. Magn. 0018-9464 31, 3865 (1995). 10.1109/20.489798