Microscopic homogeneity of emitters formed on textured silicon using in-line diffusion and phosphoric acid as the dopant source

Solar Energy Materials and Solar Cells

Volumn 93, Issue 6-7, 2009, Pages 932-935

  Voyer, Catherine ^a   Buettner, Tobias ^b   Bock, Robert ^c   Biro, Daniel ^b   Preu, Ralf ^b  

^a CENTROTHERM PHOTOVOLTAICS AG   (Germany)

^b FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^c INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

Crystalline; Diffusion; Emitter; Silicon

Indexed keywords

CHARACTERIZATION METHODS; CRYSTALLINE; DOPANT SOURCES; EMITTER; EMITTER DIFFUSIONS; IN LINES; MICROSCOPIC HOMOGENEITIES; N-TYPE SILICONS; PHOSPHO-SILICATE GLASS; QUARTZ TUBE FURNACES; SCANNING ELECTRON MICROSCOPES; SEM IMAGES; SILICON SURFACES;

ACIDS; CRYSTALLINE MATERIALS; DIFFUSION; DOPING (ADDITIVES); NONMETALS; OXIDE MINERALS; PHOSPHORIC ACID; QUARTZ; SCANNING ELECTRON MICROSCOPY;

SURFACE DIFFUSION;

EID: 65349173073     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.11.061     Document Type: Article

References (5)

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