Correlation of Fabrication Tolerances with the performance of Guided-Mode-Resonance Micro-optical components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7205, Issue , 2009, Pages

  Poutous, Menelaos K ^a   Roth, Zach ^a   Buhl, Kaia ^a   Pung, Aaron ^a   Rumpf, Raymond C ^b   Johnson, Eric G ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b Prime Research LC   (United States)

Author keywords

GMR mirror; Guided mode resonance; Lithographic process variability; Multi patterning lithography

Indexed keywords

1550 NM; COMPUTATIONAL SIMULATIONS; ETCH DEPTHS; FABRICATION TOLERANCES; GMR MIRROR; GUIDED-MODE-RESONANCE; LARGE-SCALE FABRICATIONS; LITHOGRAPHIC PROCESS VARIABILITY; MICRO-OPTICAL COMPONENTS; MULTI-PATTERNING LITHOGRAPHY; OPTICAL REFLECTANCES; PARAMETER VARIABILITIES; PATTERN TRANSFERS; PLANAR SYSTEMS; PROCESS WINDOWS; RESOLUTION LIMITS; RESONANCE PEAKS;

GALVANOMAGNETIC EFFECTS; GIANT MAGNETORESISTANCE; LASER RESONATORS; MAGNETIC RECORDING; MIRRORS; OPTICAL CORRELATION; OPTICAL FILTERS; OPTICAL RESOLVING POWER; RESONANCE; RESONATORS;

FABRICATION;

EID: 65349152031     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814514     Document Type: Conference Paper

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