Vapor phase release of silicon nanostructures for optomechanics application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7205, Issue , 2009, Pages

  Deotare, Parag B ^a   Khan, Mughees ^a   Loncar, Marko ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

HF vapor; Optical resonators; Optomechanics; Photonic crystals; Sacrificial etching; Stiction; Waveguides

Indexed keywords

AIR GAPS; CROSS SECTIONS; DRYING TECHNIQUES; ETCHING TECHNIQUES; HF VAPOR; HF VAPOR ETCHINGS; HIGH YIELDS; LIQUID FLOWS; OPTOMECHANICS; RELEASE PROCESS; SACRIFICIAL ETCHING; SILICON BASED NANOSTRUCTURES; SILICON NANOSTRUCTURES; SILICON WAVEGUIDES; VAPOR-PHASE;

CRYSTAL ATOMIC STRUCTURE; FABRICATION; HYDROFLUORIC ACID; LIQUIDS; NANOSTRUCTURES; OPTICAL RESONATORS; PHOTONICS; SILICON ON INSULATOR TECHNOLOGY; STICTION; VAPORS; WAVEGUIDES; WET ETCHING;

PHOTONIC CRYSTALS;

EID: 65349096300     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.809813     Document Type: Conference Paper

References (4)

1. Cohen AL. "Critical point drying - principles and procedure," Scanning electron microscopy 1979/II, 303-24. Ult-SEM, Microscope Technique Staining(1979).
2. A. Witvrouw, B. Du Bois, P. De Moor, A. Verbist, C. Van Hoof, H. Bender, Kris Baert, "A comparison between wet HF etching and vapour HF for sacrifice oxide removal" SPIE.
3. M.W. McCutcheon, G. W. Rieger, I. W. Cheung, J. F. Young, D. Dalacu, S. Frédérick, P.J. Poole, G. C. Aers, and R. L. Williams, Appl. Phys. Lett. 87, 221110(2005).
4. K. Rivoire, A. Faraon, and J. Vučkovič, Appl. Phys. Lett. 93, 063103(2008).