Hard x-ray photoelectron spectroscopy of buried Heusler compounds

Journal of Physics D: Applied Physics

Volumn 42, Issue 8, 2009, Pages

  Ouardi, Siham ^a   Balke, Benjamin ^a   Gloskovskii, Andrei ^a   Fecher, Gerhard H ^a   Felser, Claudia ^a   Schönhense, Gerd ^a   Ishikawa, Takayuki ^b   Uemura, Tetsuya ^b   Yamamoto, Masafumi ^b   Sukegawa, Hiroaki ^c   Wang, Wenhong ^c   Inomata, Koichiro ^c   Yamashita, Yoshiyuki ^c   Yoshikawa, Hideki ^c   Ueda, Shigenori ^c   Kobayashi, Keisuke ^c  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b HOKKAIDO UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SAMPLES; ELECTRON MEAN FREE PATHS; FERMI ENERGIES; HARD X-RAY PHOTOELECTRON SPECTROSCOPIES; HEUSLER; HEUSLER COMPOUNDS; HIGH ENERGIES; HIGH-RESOLUTION MEASUREMENTS; INSULATING LAYERS; PROTECTIVE LAYERS; VALENCE BAND SPECTRUM;

COBALT; ELECTRON SPECTROSCOPY; ELECTRONS; FERMI LEVEL; FERMIONS; INSULATING MATERIALS; IRON COMPOUNDS; MANGANESE COMPOUNDS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; SPECTRUM ANALYSIS; THIN FILMS; VALENCE BANDS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65249172515     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/8/084010     Document Type: Article

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