Structural, optical and electrical properties of chemically deposited copper selenide films

Bulletin of Materials Science

Volumn 32, Issue 1, 2009, Pages 37-42

  Bari, R H ^a   Ganesan, V ^b   Potadar, S ^b   Patil, L A ^a  

^a PRATAP COLLEGE   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Chemical bath deposition; Copper selenide; Thin films

Indexed keywords

AFM; BAND-GAP ENERGIES; CHEMICAL BATH DEPOSITION; CHEMICAL BATH DEPOSITION TECHNIQUES; COPPER SELENIDE; ELECTRICAL AND STRUCTURAL PROPERTIES; ENERGY DISPERSIVE X-RAY ANALYSIS; GLASS SUBSTRATES; GRAIN SIZES; NON STOICHIOMETRIES; NONSTOICHIOMETRIC; OPTICAL AND ELECTRICAL PROPERTIES; SEM; X-RAY DIFFRACTIONS;

COPPER; ELECTRIC PROPERTIES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ABSORPTION SPECTROSCOPY;

EID: 65249147698     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-009-0006-z     Document Type: Article

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