Electronic structure and pitting behavior of 3003 aluminum alloy passivated under various conditions

Electrochimica Acta

Volumn 54, Issue 17, 2009, Pages 4155-4163

  Liu, Y ^a   Meng, G Z ^a,b   Cheng, Y F ^a  

^a UNIVERSITY OF CALGARY   (Canada)

^b HARBIN ENGINEERING UNIVERSITY   (China)

Author keywords

Aluminum alloy; Chloride ions; Electrochemical measurements; Passivity; Pitting corrosion

Indexed keywords

3003 ALUMINUM ALLOYS; AL ALLOYS; AQUEOUS SOLUTIONS; CHLORIDE IONS; COMPETITIVE EFFECTS; CORROSION POTENTIALS; CYCLIC POLARIZATIONS; ELECTROCHEMICAL MEASUREMENTS; ELECTROCHEMICAL-IMPEDANCE SPECTROSCOPIES; FILM-FORMING; FILM-FORMING CONDITIONS; FREE SOLUTIONS; IN-BETWEEN; MOTT-SCHOTTKY ANALYSIS; N-TYPE SEMICONDUCTORS; PASSIVE FILMS; PASSIVITY; PITTING BEHAVIORS; PITTING CORROSION; PITTING SUSCEPTIBILITIES; POTENTIAL OF ZERO CHARGES; RE PASSIVATIONS; SECONDARY ION MASS SPECTROSCOPIES; TEST SOLUTIONS;

ALUMINA; ALUMINUM; ALUMINUM ALLOYS; CORROSION RESISTANCE; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRONIC STRUCTURE; IONS; PASSIVATION; PITTING; SECONDARY ION MASS SPECTROMETRY; SODIUM CHLORIDE; SOLUTIONS;

SOLUTION MINING;

EID: 65249119755     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.02.058     Document Type: Article

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