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65249183656
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While the Pauling-normalized group electronegativity of OH has been given as 3.4, compared to 3.5 for O and 2.8 for Br, in this case there are actual relevant experimental data, e.g, the dipole moment of bromoethane is 2.03 D, while that of ethanol is only 1.69 D
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While the Pauling-normalized group electronegativity of OH has been given as 3.4, compared to 3.5 for O and 2.8 for Br, in this case there are actual relevant experimental data, e.g., the dipole moment of bromoethane is 2.03 D, while that of ethanol is only 1.69 D.
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17
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3442884506
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65249096955
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XPS measurements at low sample-detector angles have shown increase of both Br 3d and O 1s intensities, implying on the appearance of both Br and OH groups on top of the molecules.
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XPS measurements at low sample-detector angles have shown increase of both Br 3d and O 1s intensities, implying on the appearance of both Br and OH groups on top of the molecules.
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20
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65249123828
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We relate the amount of oxygen on top of the monolayer before the hydrolysis to the high reactivity of the Br group as a good leaving group for nucleophylic substitution reactions
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We relate the amount of oxygen on top of the monolayer before the hydrolysis to the high reactivity of the Br group as a good leaving group for nucleophylic substitution reactions.
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21
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65249151688
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Although the appearance of native oxide on Si, H leads to a similar shift of the XPS Si 2p peak, in our case the amount of oxide changes only slightly after hydrolysis and, yet, the Si 2p peak shift is clear. Compare to ref 22
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Although the appearance of native oxide on Si - H leads to a similar shift of the XPS Si 2p peak, in our case the amount of oxide changes only slightly after hydrolysis and, yet, the Si 2p peak shift is clear. Compare to ref 22.
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1042263321
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24
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65249166318
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The presence of silicon oxide as indicated in the XPS spectrum, may contribute to the high thickness of the monolaver, as well
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The presence of silicon oxide (as indicated in the XPS spectrum. Supporting Information, Figure SI-1) may contribute to the high thickness of the monolaver, as well.
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Supporting Information, Figure SI-1)
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65249142543
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The silicon oxide is 6 (±1) % of the total coverage of the surface, as also agreed by XPS measurements.
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The silicon oxide is 6 (±1) % of the total coverage of the surface, as also agreed by XPS measurements.
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31
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65249147515
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The penetration of water and oxygen through the hydrophobic alkyl chain monolayer is less preferred than through the hydrophilic oxidized islands. Consequently, the oxide preferably grows in a lateral manner onto the silicon at the perimeter of the islands and around the islands, rather than in new locations below the bulk of the monolayer. In this way, the molecules in the periphery of the islands become less stable and can be disconnected under the alkaline conditions of the hydrolysis. The claim that molecules are less stable on oxidized silicon is easily demonstrated when immersing the silicon piece, covered with molecules, in HF solution for few minutes
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The penetration of water and oxygen through the hydrophobic alkyl chain monolayer is less preferred than through the hydrophilic oxidized islands. Consequently, the oxide preferably grows in a lateral manner onto the silicon at the perimeter of the islands and around the islands, rather than in new locations below the bulk of the monolayer. In this way, the molecules in the periphery of the islands become less stable and can be disconnected under the alkaline conditions of the hydrolysis. The claim that molecules are less stable on oxidized silicon is easily demonstrated when immersing the silicon piece, covered with molecules, in HF solution for few minutes.
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65249103719
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We define as positive a dipole whose positive pole is the one closest to the semiconductor surface
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We define as positive a dipole whose positive pole is the one closest to the semiconductor surface.
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40
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65249111940
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Note that n-type H-Si(111)/Hg contacts exhibited a nearly ohmic response at room temperature, with a very low SB. See ref 41
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Note that n-type H-Si(111)/Hg contacts exhibited a nearly ohmic response at room temperature, with a very low SB. See ref 41.
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65249187611
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After 40 min of hydrolysis, though, the trend is turned over: the currents in reverse bias and in low forward biases increase in comparison to the 20 min hydrolyzed monolayers, which is more typical for charge transport through silicon oxide see the Supporting Information, Figure SI-3, We assume that at this time scale of hydrolysis, the oxide in the layer becomes dominant in the charge transport
-
After 40 min of hydrolysis, though, the trend is turned over: the currents in reverse bias and in low forward biases increase in comparison to the 20 min hydrolyzed monolayers, which is more typical for charge transport through silicon oxide (see the Supporting Information, Figure SI-3). We assume that at this time scale of hydrolysis, the oxide in the layer becomes dominant in the charge transport.
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43
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65249171763
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We have also performed surface photovoltage (SPV) measurements on the Br-terminated monolayers before hydrolysis. Those measurements show only a small amount of band bending, despite the existence of an oxide. Comparing the SPV values of (non- hydrolyzed) Si-C11-Br with that of high quality Si-C12 (with no SiO2, we get a lower value for the Si-C11-Br than for the Si-C12 70 vs 100 mV, respectively, This means that the contribution of oxide to the band bending is negligible and, surely, does not increase the band bending in our case
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12 (70 vs 100 mV, respectively). This means that the contribution of oxide to the band bending is negligible and, surely, does not increase the band bending in our case.
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