Hetero-epitaxial growth of ZnO film by temperature-modulated metalorganic chemical vapor deposition

Applied Physics Express

Volumn 2, Issue 4, 2009, Pages 0455021-0455023

  Fujimoto, Eiji ^a,b   Sumiya, Masatomo ^a,b   Ohnishi, Tsuyoshi ^a   Watanabe, Kenji ^a   Lippmaa, Mikk ^c   Matsumoto, Yuji ^d   Koinuma, Hideomi ^a,b,c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMBINED EFFECTS; HETERO-EPITAXIAL GROWTHS; HYDROGEN ATMOSPHERES; HYDROGEN GAS ATMOSPHERES; LASER SUBSTRATES; METAL-ORGANIC CHEMICAL VAPOR DEPOSITIONS; PHONON REPLICAS; SAMPLE TEMPERATURES; SMOOTH SURFACES; TEMPERATURE DEPENDENCES; TEMPERATURE MODULATIONS; ZNO FILMS;

EPITAXIAL GROWTH; FILM GROWTH; HYDROGEN; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; MODULATION; OXYGEN; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; THERMAL EFFECTS; VAPORS; ZINC; ZINC OXIDE;

ATMOSPHERIC TEMPERATURE;

EID: 64749098831     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.045502     Document Type: Article

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