New insights in the electrodeposition mechanism of CuInSe2 thin films for solar cell applications

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 11, 2008, Pages 3445-3448

  Chassaing, Elisabeth ^a   Ramdani, Omar ^a   Grand, Pierre Philippe ^a   Guillemoles, Jean François ^a   Lincot, Daniel ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC SOLUTIONS; CURRENT PEAK; DIFFUSIONAL CONTROL; ELECTRODEPOSITION MECHANISM; IMPEDANCE DIAGRAMS; NEGATIVE POTENTIAL; PHOTOVOLTAIC SOLAR CELLS; POLARISATION; REACTION PATHS; ROTATING DISC ELECTRODE; SE COMPOUNDS; SOLAR-CELL APPLICATIONS; STEADY STATE POLARIZATION; THIN LAYERS; VOLTAMETRY;

CHARGE TRANSFER; COMPLEXATION; COPPER COMPOUNDS; ELECTRIC IMPEDANCE; ELECTROCHEMICAL CORROSION; ELECTRODEPOSITION; GROWTH (MATERIALS); ION EXCHANGE; NANOSTRUCTURES; PASSIVATION; POLARIZATION; SEMICONDUCTING SELENIUM COMPOUNDS; SOLAR CELLS; SOLAR POWER GENERATION; SYNTHESIS (CHEMICAL); THIN FILMS;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 64749092681     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200779435     Document Type: Conference Paper

References (22)

1. M. Kemell, M. Ritala, and M. Leskelä, Crit. Rev. Solid State Mater. Sci. 30, 1 (2005).
2. J. Kessler, J. Sicx-Kurdi, N. Naghavi, J.-F. Guillemoles, D. Lincot, O. Kerrec, M. Lamirand, L. Legras, and P. Mogensen, Proc. EUPV SEC 20, Barcelona, Spain, 2005.
3. D. Lincot, J.-F. Guillemoles, S. Taunier, D. Guimard, J. Sicx-Kurdi, A. Chaumont, O. Roussel, P.-P. Grand, M. Benfarah, P. Mogensen, and O. Kerrec, Sol. Energy 77, 725 (2004).
4. E. Calixto, K. D. Dobson, B. E. McCandless, and R. W. Birkmire, J. Electrochem. Soc. 153, G521 (2006).
5. J. Kois, S. Bereznev, E.Mellikov, and A. Öpik, Thin Solid Films 511, 420 (2006).
6. D. Lincot, Thin Solid Films 487, 40 (2005).
7. T. E. Schlesinger, Electrodeposition of Semiconductors in Modern Electroplating, edited by M. Schlesinger and M. Paunovic (J. Wiley & Sons Inc., 2000), p. 585.
8. I. M. Dharmadasa and J. Haigh, J. Electrochem. Soc. 153, G47 (2006).
9. R. N. Bhattacharya, J. Electrochem. Soc. 130, 2040 (1983).
10. D. Pottier and G. Maurin, J. Appl. Electrochem. 19, 361 (1989).
11. K. Mishra and K. Rajeshwar, J. Electroanal.Chem. 271(1/2), 279 (1989).
12. L. Thouin and J. Vedel, J. Electrochem. Soc. 142, 2996 (1995).
13. S. Massaccesi, S. Sanchez, and J. Vedel, J. Electrochem. Soc. 140, 2540 (1993).
14. S. Menezes, Mater. Res. Soc. Symp. Proc. 426, 189 (1996).
15. M. Oliveira, M. Azevedo, and A. Cunha, Thin Solid Films 405, 129 (2002).
16. M. Pourbaix, Atlas Electrochimique (Gauthier-Villars, 1963).
17. G. Sasikala, S. M. Babu, and R. Dhanasekaran, Mater. Chem. Phys. 42, 210 (1995).
18. R. S. Laitinen, P. Pekonen, and R. J. Suontamo, Coordinat. Chem. Rev. 130, 1 (1994).
19. O. Ramdani, J.-F. Guillemoles, P.-P. Grand, E. Chassaing, D. Lincot, and E. Repka, to be published.
20. G. Maurin, O. Solorza, and H. Takenouti, J. Electroanal. Chem. 202, 323. (1986).
21. S. Rouquette-Sanchez, P. Cowache, P. Boncorps, and J. Vedel, Electrochim. Acta 38, 2043 (1993).
22. E. Chassaing, O. Roussel, O. Ramdani, P.-P. Grand, B. Canava, A. Etcheberry, J.-F. Guillemoles, and D. Lincot, SOTAPOCS 46, The Electrochemical Soc. (Eds.), Vol.6, Issue 2, 577 (2007).