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Volumn , Issue , 2008, Pages
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Scaling of 32nm low power SRAM with high-K metal gate
a a b c c d e a f d f a e a e g a a c c more.. |
Author keywords
[No Author keywords available]
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Indexed keywords
BULK TECHNOLOGIES;
CELL PROCESS;
CONTACT PROCESS;
LOW POWER APPLICATIONS;
LOW-POWER;
LOW-POWER SRAM;
METAL GATES;
READ CURRENTS;
VT MISMATCHES;
WRITE MARGINS;
ELECTRON DEVICES;
STATIC RANDOM ACCESS STORAGE;
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EID: 64549129929
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IEDM.2008.4796660 Document Type: Conference Paper |
Times cited : (34)
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References (3)
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