Highly reliable CMOS-integrated 11MPixel SiGe- Based micro-mirror arrays for high-end industrial applications

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2008, Pages

  Haspeslagh, Luc ^a   De Coster, Jeroen ^a   Pedreira, Olalla Varela ^a   De Wolf, Ingrid ^a,b   Bois, Bert Du ^a   Verbist, Agnes ^a   Van Hoof, Rita ^a   Willegems, Myriam ^a   Locorotondo, Sabrina ^a   Bryce, George ^a   Vaes, Jan ^a   Van Drieenhuizen, Bert ^c   Witvrouw, Ann ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG VOLTAGES; CMOS WAFERS; LONG LIFETIMES; MICRO-MIRROR ARRAYS; OPTICAL MASKLESS LITHOGRAPHIES; RMS ROUGHNESS; SPATIAL-LIGHT MODULATORS; TILT ANGLES;

ELECTRON DEVICES; INDUSTRIAL APPLICATIONS; LIGHT MODULATORS; MIRRORS; PIXELS; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON ALLOYS;

LIGHT MODULATION;

EID: 64549125945     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2008.4796779     Document Type: Conference Paper

References (11)

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