High critical current density YBa2Cu3O 7-δ thin films fabricated by ex situ processing at low pressures

Superconductor Science and Technology

Volumn 17, Issue 10, 2004, Pages 1154-1159

  Zhang, Y ^a,b   Feenstra, R ^a   Thompson, J R ^a,c   Gapud, A A ^a   Aytug, T ^a   Martin, P M ^a   Christen, D K ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b University of Tennessee   (United States)

^c UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BOUNDARY LAYERS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DECOMPOSITION; MORPHOLOGY; NUCLEATION; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; YTTRIUM BARIUM COPPER OXIDES;

CARRIER GASES; EX SITU POST-DEPOSITION PROCESSING; GAS FLOWS;

SUPERCONDUCTING FILMS;

EID: 6444229794     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/17/10/012     Document Type: Article

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